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  1. 1
    Enhanced EUV photoresist and methods of use thereof

    Enhanced EUV photoresist and methods of use thereof von LADA TOM, JACKSON EDWARD, ROTH JOHN, ROBINSON ALEX P. G, O 'CALLAGHAN GREG

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  2. 2
    Enhanced EUV photoresist including a core tris(4-hydroxyphenyl)methane group and having improved sensitivity (photosensitivity), resolution (line width roughness), or both

    Enhanced EUV photoresist including a core tris(4-hydroxyphenyl)methane group and having improved sensitivity (photosensitivity), resolution (line width roughness), or both von MELONI, FERNANDA, MCCLELLAND, ALEXANDRA, JACKSON, ED, ROBINSON, ALEX P. G, NGUYEN, VAN HUY, O '' CALLAGHAN, GREG

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  3. 3
    DERIVATIVES OF 4-HYDROXYPHENYLALKANOIC ACIDS, PROCESS OF THEIR PREPARATION AND PHARMACEUTICAL COMPOSITION CONTAINING THEREOF

    DERIVATIVES OF 4-HYDROXYPHENYLALKANOIC ACIDS, PROCESS OF THEIR PREPARATION AND PHARMACEUTICAL COMPOSITION CONTAINING THEREOF von HENKE BRAD RICHARD, BOSWELL GRADY EVAN, KALDOR ISTVAN, WILLSON TIMOTHY MARK, DEATON DAVID NORMAN, BRACKEEN MARCUS, SHARP MATTHEW JUDE, ERICKSON GREG ALAN, COLLINS JON LOREN, O CALLAGHAN JOHN MARK, MOOK ROBERT ANTHONY JR, COBB JEFFREY EDMOND

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  4. 4
    Derivative of substituted 4-hydroxyphenylalkanoic acid and pharmaceutical composition

    Derivative of substituted 4-hydroxyphenylalkanoic acid and pharmaceutical composition von HENKE BRAD RICHARD, BOSWELL GRADY EVAN, KALDOR ISTVAN, WILLSON TIMOTHY MARK, DEATON DAVID NORMAN, BRACKEEN MARCUS, SHARP MATTHEW JUDE, ERICKSON GREG ALAN, COLLINS JON LOREN, O CALLAGHAN JOHN MARK, MOOK ROBERT ANTHONY JR, COBB JEFFREY EDMOND

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