Intensity distribution of transverse electric wave diffracted by a perfectly black half plane or an infinite slit opened in a perfectly black plane von NONOGAKI, Saburo

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High-resolution proximity exposure through a phase shifter mask von NONOGAKI, S, IMAI, A

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The Photopolymer Science and Technology Award von Nonogaki, Saburo

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A Rigorous Solution of Two-Dimensional Diffraction Based on the Huygens-Fresnel Principle von Nonogaki, Saburo

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A new water-soluble photoresist used a polymeric azide compound as a photosensitizer von Morishita, Hajime, Ito, Masato, Hayashi, Nobuaki, Nonogaki, Saburo, Odaka, Yoshiyuki, Nishizawa, Masahiro

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Thermolysis of an azide-phenolic resin composite film and its use as an antireflective bottom layer in the three-layer resist process von IWAYANAGI, T, HASHIMOTO, M, NONOGAKI, S, SHIRAI, S, MORIUCHI, N

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Photochemistry of azide-phenolic resin photoresists von Hashimoto, Michiaki, Iwayanagi, Takao, Shiraishi, Hiroshi, Nonogaki, Saburo

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Resolution Capability of Resist von NONOGAKI, Saburo

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Azide-phenolic resin UV resist (MRL) for microlithography von Iwayanagi, Takao, Hashimoto, Michiaki, Nonogaki, Saburo, Koibuchi, Shigeru, Makino, Daisuke

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Resolution Capability of Resist von NONOGAKI, Saburo

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Epoxide-Containing Polymers as Highly Sensitive Electron-Beam Resists von Hirai, Takako, Hatano, Yoshio, Nonogaki, Saburo

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PGMA as a High Resolution, High Sensitivity Negative Electron Beam Resist von Taniguchi, Yoshio, Hatano, Yoshio, Shiraishi, Hiroshi, Horigome, Shinkichi, Nonogaki, Saburo, Naraoka, Kiyotake

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A water-soluble, reciprocity-law-failing photoresist von Akagi, Motoo, Nonogaki, Saburo, Kohashi, Takahiro, Oba, Yoichi, Oikawa, Mitsuru, Tomita, Yoshifumi

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Photosensitive resist materials von Nonogaki, Saburo

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Recent resist developments in Japan-a review von Nonogaki, Saburo

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Photosensitive Resist Materials von Nonogaki, Saburo

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Polyvalent Anion-Exchange Resins Composed of Cross-Linked Polyethyleneimine Complexes of Heavy Metals von Nonogaki, Saburo, Makishima, Shoji, Yoneda, Yukio

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Fine Chromium Grating Directly Made by Irradiating Electron Beam von Maekawa, Akiji, Munakata, Chusuke, Miura, Yoji, Honda, Yukio, Saitou, Norio, Nonogaki, Saburo

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Mask Fabrication with Submicron Line-Width by Electron Beam von Saitou, Norio, Morishita, Hajime, Nonogaki, Saburo, Itoh, Hisatsugu, Maekawa, Akiji

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New Water-Soluble Positive Photoresist von HAYASHI, Nobuaki, NONOGAKI, Saburo

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