Three-dimensional etching of silicon substrates using a modified deep reactive ion etching technique von Azimi, S, Sandoughsaz, A, Amirsolaimani, B, Naghsh-Nilchi, J, Mohajerzadeh, S

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Fluorine-free high-resolution selective plasma etching of silicon-oxide layers on silicon substrates von Abdolahad, M, Nilchi, J Naghsh, Mohajerzadeh, S

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High aspect ratio hydrogenation-assisted lateral etching of (1 0 0) silicon substrates von Kayyalha, M, Nilchi, J Naghsh, Ebrahimi, A, Mohajerzadeh, S

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A New Approach to Motion Vector Estimation von Ebrahimi, H., Nilchi, A., Vahdat-Nejad, H.

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