Challenges in the characterization and modeling of BTI induced variability in metal gate / High-k CMOS technologies von Kerber, A., Nigam, T.

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Soft breakdown of ultra-thin gate oxide layers von Depas, M., Nigam, T., Heyns, M.M.

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Bias temperature instability in scaled CMOS technologies: A circuit perspective von Kerber, A., Nigam, T.

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Impact of Transistor Level degradation on product reliability von Nigam, T.

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Model for the current–voltage characteristics of ultrathin gate oxides after soft breakdown von Houssa, M., Nigam, T., Mertens, P. W., Heyns, M. M.

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On the properties of the gate and substrate current after soft breakdown in ultrathin oxide layers von Crupi, F., Degraeve, R., Groeseneken, G., Nigam, T., Maes, H.E.

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Impact of charge trapping on the voltage acceleration of TDDB in metal gate/high-k n-channel MOSFETs von Kerber, A, Vayshenker, A, Lipp, D, Nigam, T, Cartier, E

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Exploring the effects of hypoxia and reoxygenation time on hepatocyte apoptosis and inflammation von Xu, Xinlu, Zhou, Tanfang, Tulahong, Alimu, Ruze, Rexiati, Shao, Yingmei

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Mitochondrial DNA is a sensitive surrogate and oxidative stress target in oral cancer cells von Tan, Jingyu, Dong, Xinlin, Liu, Haiwen

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Soft breakdown in ultrathin gate oxides: Correlation with the percolation theory of nonlinear conductors von Houssa, M., Nigam, T., Mertens, P. W., Heyns, M. M.

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Nature and location of interface traps in RF LDMOS due to hot carriers von Nigam, T., Shibib, A., Xu, S., Safar, H., Steinberg, L.

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Estimation of oceanic subsurface mixing under a severe cyclonic storm using a coupled atmosphere–ocean–wave model von Prakash, Kumar Ravi, Nigam, Tanuja, Pant, Vimlesh

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Accurate model for time-dependent dielectric breakdown of high-k metal gate stacks von Nigam, T., Kerber, A., Peumans, P.

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Fast characterization of the Static Noise Margin degradation of cross-coupled inverters and correlation to BTI instabilities in MG/HK devices von Kerber, A, Pimparkar, N, Balasubramanian, S, Nigam, T, McMahon, W, Cartier, E

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A Qualitative Review of Balance and Strength Performance in Healthy Older Adults: Impact for Testing and Training von Granacher, Urs, Muehlbauer, Thomas, Gruber, Markus

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Definition of dielectric breakdown for ultra thin (<2 nm) gate oxides von Depas, M, Nigam, T, Heyns, M.M

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The vertical replacement-gate (VRG) MOSFET von Hergenrother, J.M., Oh, Sang-Hyun, Nigam, T., Monroe, D., Klemens, F.P., Kornblit, A.

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Hot carrier degradation and time-dependent dielectric breakdown in oxides von Groeseneken, G., Degraeve, R., Nigam, T., Van den bosch, G., Maes, H.E.

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Major and trace element geochemistry of Bay of Bengal sediments: Implications to provenances and their controlling factors von Tripathy, Gyana Ranjan, Singh, Sunil Kumar, Ramaswamy, V.

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Investigation of temperature acceleration of thin oxide time-to-breakdown von Kaczer, B., Degraeve, R., Pangon, N., Nigam, T., Groeseneken, G.

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