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CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH ISOLATION (STI) APPLICATIONS AND METHODS OF MAKING THEREOF von Hughes, John Edward Quincy, Choo, Jae Ouk, Nbach, Laura Lede, Usmani, Saifi, Mungai, Martin Kamau Ngigi, Castillo, II, Daniel Hernandez, Winchester, Steven Charles, Schlueter, James Allen, Marsella, John Anthony, Shi, Xiaobo, Zhou, Hongjun, Schwartz, Jo-Ann Theresa

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CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH ISOLATION (STI) APPLICATIONS AND METHODS OF MAKING THEREOF von Hughes, John Edward Quincy, Choo, Jae Ouk, Nbach, Laura Lede, Usmani, Saifi, Mungai, Martin Kamau Ngigi, Castillo, II, Daniel Hernandez, Winchester, Steven Charles, Schlueter, James Allen, Marsella, John Anthony, Shi, Xiaobo, Zhou, Hongjun, Schwartz, Jo-Ann Theresa

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CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR SHALLOW TRENCH ISOLATION (STI) APPLICATIONS AND METHODS OF MAKING THEREOF von CASTILLO, DANIEL HERNANDEZ, SCHLUETER, JAMES ALLEN, WINCHESTER, STEVEN CHARLES, MARSELLA, JOHN ANTHONY, HUGHES, JOHN EDWARD QUINCY, USMANI, SAIFI, SHI, XIAOBO, ZHOU, HONGJUN, CHOO, JAE OUK, SCHWARTZ, JO-ANN THERESA, NBACH, LAURA LEDE

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Chemical mechanical polishing (cmp) composition for shallow trench isolation (sti) applications and methods of making thereof von CASTILLO, DANIEL HERNANDEZ, SCHLUETER, JAMES ALLEN, WINCHESTER, STEVEN CHARLES, MARSELLA, JOHN ANTHONY, HUGHES, JOHN EDWARD QUINCY, USMANI, SAIFI, SHI, XIAOBO, ZHOU, HONGJUN, CHOO, JAE OUK, SCHWARTZ, JO-ANN THERESA, NBACH, LAURA LEDE

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Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof von CASTILLO, DANIEL HERNANDEZ, SCHLUETER, JAMES ALLEN, WINCHESTER, STEVEN CHARLES, MARSELLA, JOHN ANTHONY, HUGHES, JOHN EDWARD QUINCY, CHOO, JAE-OUK, USMANI, SAIFI, SHI, XIAOBO, ZHOU, HONG-JUN, SCHWARTZ, JO-ANN THERESA, NBACH, LAURA LEDE

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Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof von JOHN ANTHONY MARSELLA, JO-ANN THERESA SCHWARTZ, STEVEN CHARLES WINCHESTER, SAIFI USMANI, XIAOBO SHI, LAURA LEDE NBACH, JAE OUK CHOO, JAMES ALLEN SCHLUETER, JOHN EDWARD QUINCY HUGHES, HONGJUN ZHOU, DANIEL HERNANDEZ CASTILLO, II

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Chemical mechanical polishing (CMP) composition for Shallow Trench Isolation (STI) applications and methods of making thereof von CASTILLO, DANIEL HERNANDEZ, SCHLUETER, JAMES ALLEN, WINCHESTER, STEVEN CHARLES, MARSELLA, JOHN ANTHONY, HUGHES, JOHN EDWARD QUINCY, CHOO, JAE-OUK, USMANI, SAIFI, SHI, XIAOBO, ZHOU, HONG-JUN, SCHWARTZ, JO-ANN THERESA, NBACH, LAURA LEDE

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