Characterization of Highly Doped Si:P, Si:As and Si:P:As Epi Layers for Source/Drain Epitaxy von Rosseel, Erik, Tirrito, Matteo, Porret, Clement, Douhard, Bastien, Meersschaut, Johan, Hikavyy, Andriy Yakovitch, Loo, Roger, Horiguchi, Naoto, Pourtois, Geoffrey, Nakazaki, Nabuyo, Tolle, John

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