Interface controlled thermal resistances of ultra-thin chalcogenide-based phase change memory devices von Aryana, Kiumars, Gaskins, John T., Nag, Joyeeta, Stewart, Derek A., Bai, Zhaoqiang, Mukhopadhyay, Saikat, Read, John C., Olson, David H., Hoglund, Eric R., Howe, James M., Giri, Ashutosh, Grobis, Michael K., Hopkins, Patrick E.

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Tuning network topology and vibrational mode localization to achieve ultralow thermal conductivity in amorphous chalcogenides von Aryana, Kiumars, Stewart, Derek A., Gaskins, John T., Nag, Joyeeta, Read, John C., Olson, David H., Grobis, Michael K., Hopkins, Patrick E.

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Suppressed electronic contribution in thermal conductivity of Ge2Sb2Se4Te von Aryana, Kiumars, Zhang, Yifei, Tomko, John A., Hoque, Md Shafkat Bin, Hoglund, Eric R., Olson, David H., Nag, Joyeeta, Read, John C., Ríos, Carlos, Hu, Juejun, Hopkins, Patrick E.

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Observation of solid-state bidirectional thermal conductivity switching in antiferroelectric lead zirconate (PbZrO3) von Aryana, Kiumars, Tomko, John A., Gao, Ran, Hoglund, Eric R., Mimura, Takanori, Makarem, Sara, Salanova, Alejandro, Hoque, Md Shafkat Bin, Pfeifer, Thomas W., Olson, David H., Braun, Jeffrey L., Nag, Joyeeta, Read, John C., Howe, James M., Opila, Elizabeth J., Martin, Lane W., Ihlefeld, Jon F., Hopkins, Patrick E.

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Electronic vs phononic thermal transport in Cr-doped V2O3 thin films across the Mott transition von Mohr, Johannes, Aryana, Kiumars, Islam, Md. Rafiqul, Wouters, Dirk J., Waser, Rainer, Hopkins, Patrick E., Nag, Joyeeta, Bedau, Daniel

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Ultrafast Phase Transition via Catastrophic Phonon Collapse Driven by Plasmonic Hot-Electron Injection von Appavoo, Kannatassen, Wang, Bin, Brady, Nathaniel F, Seo, Minah, Nag, Joyeeta, Prasankumar, Rohit P, Hilton, David J, Pantelides, Sokrates T, Haglund, Richard F

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Synthesis of vanadium dioxide thin films and nanoparticles von Nag, Joyeeta, Haglund Jr, R F

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Epitaxial VO2 Nanostructures: A Route to Large-Scale, Switchable Dielectric Metasurfaces von Ligmajer, Filip, Kejík, Lukáš, Tiwari, Uddhab, Qiu, Meng, Nag, Joyeeta, Konečný, Martin, Šikola, Tomáš, Jin, Wei, Haglund, Richard F, Appavoo, Kannatassen, Lei, Dang Yuan

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Phase Transformation Driven by Oxygen Vacancy Redistribution as the Mechanism of Ferroelectric Hf0.5Zr0.5O2 Fatigue von Zhang, Zimeng, Craig, Isaac, Zhou, Tao, Holt, Martin, Flores, Raul, Sheridan, Evan, Inzani, Katherine, Huang, Xiaoxi, Nag, Joyeeta, Prasad, Bhagwati, Griffin, Sinéad M., Ramesh, Ramamoorthy

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Heterogeneous nucleation and growth dynamics in the light-induced phase transition in vanadium dioxide von Brady, Nathaniel F, Appavoo, Kannatassen, Seo, Minah, Nag, Joyeeta, Prasankumar, Rohit P, Haglund, Richard F, Hilton, David J

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Fabrication of Highly Resistive NiO Thin Films for Nanoelectronic Applications von Mohr, Johannes, Hennen, Tyler, Bedau, Daniel, Nag, Joyeeta, Waser, Rainer, Wouters, Dirk J.

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Doping-driven electronic and lattice dynamics in the phase-change material vanadium dioxide von Appavoo, Kannatassen, Nag, Joyeeta, Wang, Bin, Luo, Weidong, Duscher, Gerd, Payzant, E. Andrew, Sfeir, Matthew Y., Pantelides, Sokrates T., Haglund, Richard F.

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Synthesis of vanadium dioxide thin films and nanoparticles von Nag, Joyeeta, Haglund Jr, R F

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Photothermal optical modulation of ultra-compact hybrid Si-VO_2 ring resonators von Ryckman, Judson D., Diez-Blanco, V., Nag, Joyeeta, Marvel, Robert E., Choi, B. K., Haglund, Richard F., Weiss, Sharon M.

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Inherent area selective deposition of silicon dioxide in multilayer 3D SiO x –SiN x stacks von Sondhi, Kartik, Ross, Stephen, Nag, Joyeeta, Guo, X. C., Zhao, Dexin, Rajashekhar, Adarsh, Kanakamedala, Senaka

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Inherent area selective deposition of silicon dioxide in multilayer 3D SiOx–SiNx stacks von Sondhi, Kartik, Ross, Stephen, Nag, Joyeeta, Guo, X. C., Zhao, Dexin, Rajashekhar, Adarsh, Kanakamedala, Senaka

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Understanding 3D anisotropic reactive ion etching of oxide-metal stacks von Golani, Prafful, Tirukkonda, Roshan J., Fancher, Aaron N., Ross, Stephen R., Kraman, Mark D., Sharangpani, Rahul, Nag, Joyeeta, Sondhi, Kartik, Bogdanov, Alexei L., Kanakamedala, Senaka K.

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Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling von Tirukkonda, Roshan J., Kraman, Mark D., Sharangpani, Rahul, Sondhi, Kartik, Fancher, Aaron N., Ross, Stephen R., Nag, Joyeeta, Bogdanov, Alexei L., Makala, Raghuveer S., Kanakamedala, Senaka K.

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Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks von Sondhi, Kartik, Sharangpani, Rahul, Tirukkonda, Roshan, Nag, Joyeeta, Guo, Xing-Cai, Gribelyuk, Michael A., Makala, Raghuveer S., Kanakamedala, Senaka

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Area selective deposition of ruthenium on 3D structures von Sondhi, Kartik, Sharangpani, Rahul, Said, Ramy Nashed Bassely, Nag, Joyeeta, Gribelyuk, Michael, Kanakamedala, Senaka, Makala, Raghuveer S.

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