A lithium liquid metal ion source with a narrow angle emission for writing beam lithography von Hesse, E., Naehring, F.K., Teichert, J.

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Focused ion beam system with high current density von Bischoff, L., Hesse, E., Janssen, D., Naehring, F.K., Nötzold, F., Schmidt, G., Teichert, J.

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High current FIB system for micromechanics application von Bischoff, L., Hesse, E., Hofmann, G., Naefring, F.K., Probst, W., Schmidt, B., Teichert, J.

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