Surface properties of Cr2O3 von KIRBY, R. E, GARWIN, E. L, KING, F. K, NYAIESH, A. R

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The growth of amorphous and graphitic carbon layers under ion bombardment in an rf plasma von Nyaiesh, A.R., Holland, L.

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Amorphous hard carbon films on polycarbonate substrates von Nyaiesh, A.R., Holland, L

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Target profile change during magnetron sputtering von Nyaiesh, AR

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The characteristics of a planar magnetron operated at a high power input von Nyaiesh, A.R.

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Metallization of plastics by magnetron sputtering for application of membrane switching von Nyaiesh, A.R., Watson, J.D., Morgon, J, Elphick, C

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The effect of gas purity on the reflectance and resistivity of magnetron sputtered aluminium and its alloys von Nyaiesh, AR, Holland, L

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Hydrogen evolution from a-C:H films von Nyaiesh, AR, Nowak, WB

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The dependence of deposition rate on power input for dc and rf magnetron sputtering von Nyaiesh, AR, Holland, L

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Design and construction of a small electromagnetron for sputtering use von Nyaiesh, AR, Elphick, C

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The effects of gas composition on discharge and deposition characteristics when magnetron sputtering aluminium von Nyaiesh, AR, Holland, L

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Deposition of silver electrodes on plastics foils by magnetron sputtering von Nyaiesh, AR, Elphick, C

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Plasma etch and deposition monitoring with an oscillating quartz crystal von Nyaiesh, AR, Baker, MA

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Energy loss of fast H2+ molecules in solids. II von Nyaiesh, A R, Steckelmacher, W, Lucas, M W

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Properties and characteristics of Al-films deposited in dc and rf magnetron systems von Nyaiesh, A R, Holland, L

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A high stability low cost film thickness monitor von Nyaiesh, AR

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Metallization of plastics by magnetron sputtering for applications of membrane switching von Nyaiesh, A R, Morgon, J, Watson, J D, Elphick, C

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Energy loss of fast H 2 + molecules in solids. II von Nyaiesh, A R, Steckelmacher, W, Lucas, M W

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Properties and characteristics of Al-films deposited in do and rf magnetron systems von Nyaiesh, AR, Holland, L

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Stabilized chromium oxide film von GARWIN, EDWARD L, NYAIESH, ALI R

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