Coulomb Interaction Effect in Cell Projection Lithography von Yamashita, Hiroshi, Tamura, Takao, Nomura, Eiichi, Hiroshi Nozue, Hiroshi Nozue

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Improved proximity effect correction technique suitable for cell projection electron beam direct writing system von TAMURA, T, NAKAJIMA, K, NOZUE, H

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Present Status of Exposure Tool Development for Low Energy Electron-beam Proximity Projection Lithography von Endo, Akihiro, Higuchi, Akira, Kasahara, Haruo, Nozue, Hiroshi, Shimazu, Nobuo, Fukui, Toyoji, Yasumitsu, Naoki, Miyatake, Tsutomu, Anazawa, Norimichi

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0.15 µm Electron Beam Direct Writing for Gbit Dynamic Random Access Memory Fabrication von Nakajima, Ken, Yamashita, Hiroshi, Kojima, Yoshikatsu, Hirasawa, Satomi, Tamura, Takao, Yamada, Yasuhisa, Tokunaga, Kenichi, Ema, Takahiro, Kondoh, Kenji, Naka Onoda, Naka Onoda, Hiroshi Nozue, Hiroshi Nozue

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Coulomb interaction effect in cell projection lithography von YAMASHITA, H, TAMURA, T, NOMURA, E, NOZUE, H

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LINEAR TEMPERATURE FUSE von NOZUE HIROSHI

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Recent progress in electron-beam cell projection technology von YAMASHITA, H, NOZUE, H, NOMURA, E, ITOH, K, EMA, T, HIRASAWA, S, KOJIMA, K, TAMURA, T, NAKAJIMA, K

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CORD-LIKE TEMPERATURE FUSE von NOZUE HIROSHI

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TEMPERATURE DETECTOR von NOZUE HIROSHI

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LINEAR THERMAL FUSE von NOZUE HIROSHI

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High-performance membrane mask for electron projection lithography von Yamashita, Hiroshi, Amemiya, Isao, Nomura, Eiichi, Nakajima, Ken, Nozue, Hiroshi

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METHOD FOR MANUFAXCTURING OF TEMPERATURE DETECTOR von NOZUE HIROSHI

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TEMPERATURE DETECTING ELEMENT von NOZUE HIROSHI

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TEMPERATURE DETECTOR von NOZUE HIROSHI

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Digital media applications on a CELL software platform von Kato, N., Takeuchi, K., Maeda, S., Shimbayashi, M., Sakai, R., Nozue, H., Amemiya, J.

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TEMPERATURE DETECTING DEVICE AND SAFETY DEVICE FOR HOT WATER SUPPLIER von NOZUE HIROSHI, IKUMA MUNEAKI

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Proximity effect correction by the GHOST method using a scattering stencil mask von Yamashita, Hiroshi, Nomura, Eiichi, Manako, Shoko, Kobinata, Hideo, Nakajima, Ken, Nozue, Hiroshi

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MASK FOR ELECTRON BEAM EXPOSURE, AND METHOD OF EXPOSURE USING THE MASK von NOZUE HIROSHI

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STENCIL MASK AND ITS MANUFACTURING METHOD von NOZUE HIROSHI

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CHARGE PARTICLE EXPOSURE METHOD, COMPLEMENTARILY DIVIDED MASK USED FOR IT, AND SEMICONDUCTOR DEVICE PRODUCED BY USING THE METHOD von HIROSHI NOZUE

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