Thermal stability of Al- and Zr-doped HfO{sub 2} thin films grown by direct current magnetron sputtering von Hong, Yeong-Eui, Kim, Yong-Seok, Do, Kihoon, Lee, Dongwon, Ko, Dae-Hong, Ku, Ja-Hum, Kim, Hyoungsub, Semiconductor R and D Division, Samsung Electronics Co, Ltd., San no. 24, Nongseo-Ri, Kiheung-Eup, Yongin-City, Kyunggi-Do 449-711, Department of Advanced Materials Engineering, Sungkyunkwan University, 300 Chunchun-Dong, Jangan-Ku, Suwon 440-746

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MIKROELEKTRONISCHER DETEKTOR AUF EINEM CHIP von YOON, DAE-SUNG, CHO, YOON-KYOUNG, 203-1605 HWANGGOL MA, YOUNGTONG-D, LEE, YOUNG-SUN, LIM, GEUN-BAE, 232-1205 HWANGGOL MAEUL, KANG, SEONG-HO, NONGSEO-RI, YOUNGTONG-DONG

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