Particle Generation on Hydrogen-Terminated Si Surface by Brush Scrubbing of Polyvinyl Alcohol von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Effects of wafer spin speed during dry etch post-wet cleaning on a metal line von Sato, Nobuyoshi

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Particle adsorption behaviors during solvent cleaning containing NH4F von Sato, Nobuyoshi

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Peeling model of dielectric film including low-k material on wafer edge von Sato, Nobuyoshi

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Adsorption Model of Organic Molecules on the Surface of Thermally Oxidized Silicon von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Proposal of a Next Generation Network Architecture Based on Web Service Technologies von MURATA, Yoshitoshi, TAKAYAMA, Tsuyoshi, SATO, Nobuyoshi, KIKUCHI, Kei

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The effects of dense carbon dioxide on nickel plating using emulsion of carbon dioxide in electroplating solution von Yan, Hao, Sone, Masato, Sato, Nobuyoshi, Ichihara, Shoji, Miyata, Seizo

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Nano-grain structure of nickel films prepared by emulsion plating using dense carbon dioxide von Wakabayashi, Hiroaki, Sato, Nobuyoshi, Sone, Masato, Takada, Yukinobu, Yan, Hao, Abe, Kentaro, Mizumoto, Kazunari, Ichihara, Shoji, Miyata, Seizo

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Crystal Growth and Characterization of Li x La (1– x )/3 NbO 3 by the Traveling Solvent Floating Zone Method von Ali, Md. Shahajan, Sato, Nobuyoshi, Fukasawa, Ikuya, Maruyama, Yuki, Nagao, Masanori, Watauchi, Satoshi, Tanaka, Isao

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Impacts of Chemical Supply Flow on Particle Removability in Wet Clean Bath von Sato, Nobuyoshi, Yamazaki, Osamu, Shimogaki, Yukihiro

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Comparative Surface Study on Hydrogen Terminated Si Surface Covered with Alcohols von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Dependency of the Underlying Surface Condition on Dielectric Film Removal at Wafer Edge von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Relationship between Surface Free Energy of Underlying Layers and O 3 -TEOS Chemical Vapor Deposition von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Relationship between Surface Free Energy of Underlying Layers and O3-TEOS Chemical Vapor Deposition von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Meniscus behavior under helium exposure for rapid resist spreading during nanoimprint lithography von Kashiwagi, Hiroyuki, Sato, Nobuyoshi, Hatano, Masayuki, Jung, Wooyung, Kono, Takuya, Nakasugi, Tetsuro

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Gap Filling Model of O 3 -Tetraethylorthosilicate Film Formed on an Underlying Layer Pretreated with Organic Solvent von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Gap Filling Model of O3-Tetraethylorthosilicate Film Formed on an Underlying Layer Pretreated with Organic Solvent von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Pattern Density Dependency of the Underlying Layer on O 3 -Tetraethylorthosilicate (TEOS) Film Formation von Sato, Nobuyoshi, Shimogaki, Yukihiro

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Effect of particle size reduction on crack formation in electrophoretically deposited YBCO films von Sato, Nobuyoshi, Kawachi, Masaharu, Noto, Koshichi, Yoshimoto, Noriyuki, Yoshizawa, Masahito

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O 3 -TEOS CVD Film Formation on Thermal SiO 2 Pre-Coated with Ethanol von Sato, Nobuyoshi, Shimogaki, Yukihiro

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