Explosive crystallization of amorphous silicon films by flash lamp annealing von Ohdaira, Keisuke, Fujiwara, Tomoko, Endo, Yohei, Nishizaki, Shogo, Matsumura, Hideki

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Comparison of a-Si TFTs fabricated by Cat-CVD and PECVD methods von Nishizaki, Shogo, Ohdaira, Keisuke, Matsumura, Hideki

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Thin-film polycrystalline silicon solar cells formed by flash lamp annealing of a-Si films von Endo, Yohei, Fujiwara, Tomoko, Ohdaira, Keisuke, Nishizaki, Shogo, Nishioka, Kensuke, Matsumura, Hideki

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Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing von Ohdaira, Keisuke, Fujiwara, Tomoko, Endo, Yohei, Nishizaki, Shogo, Matsumura, Hideki

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Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealing von Ohdaira, Keisuke, Shiba, Kazuhiro, Takemoto, Hiroyuki, Fujiwara, Tomoko, Endo, Yohei, Nishizaki, Shogo, Jang, Young Rae, Matsumura, Hideki

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Study on Stability of Amorphous Silicon Thin-Film Transistors Prepared by Catalytic Chemical Vapor Deposition von Nishizaki, Shogo, Ohdaira, Keisuke, Matsumura, Hideki

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Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing von HEYA, Akira, NISHIZAKI, Shogo, KAWAMOTO, Naoya, OHDAIRA, Keisuke, MATSUMURA, Hideki, MATSUO, Naoto

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Advantage of plasma-less deposition in Cat-CVD to the performance of electronic devices von Matsumura, Hideki, Hasegawa, Tomoaki, Nishizaki, Shogo, Ohdaira, Keisuke

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Formation of Highly Uniform Micrometer-Order-Thick Polycrystalline Silicon Films by Flash Lamp Annealing of Amorphous Silicon on Glass Substrates von Ohdaira, Keisuke, Endo, Yohei, Fujiwara, Tomoko, Nishizaki, Shogo, Matsumura, Hideki

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Advantage of plasma-less deposition: Cat-CVD fabrication of a-Si TFT with current drivability equivalent to poly-Si TFT von Matsumura, Hideki, Ohdaira, Keisuke, Nishizaki, Shogo

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Explosive crystallization of amorphous silicon films by flashlamp annealing von Ohdaira, Keisuke, Fujiwara, Tomoko, Endo, Yohei, Nishizaki, Shogo, Matsumura, Hideki

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Poly-Si films with long carrier lifetime prepared by rapid thermal annealing of Cat-CVD amorphous silicon thin films von Ohdaira, Keisuke, Abe, Yuki, Fukuda, Makoto, Nishizaki, Shogo, Usami, Noritaka, Nakajima, Kazuo, Karasawa, Takeshi, Torikai, Tetsuya, Matsumura, Hideki

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DISPLAY PANEL von KIM, Jaehyun, CHOI, Young Seo, NISHIZAKI, Shogo

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ELECTRONIC DEVICE von CHOI, YOUNG SEO, KIM, JAEHYUN, NISHIZAKI, SHOGO

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ELECTRONIC DEVICE von KIM, Jaehyun, CHOI, Young Seo, NISHIZAKI, Shogo

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DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME von Jeong, Soyeon, Kim, Jaehyun, Jo, Wonje, Lee, Cheho, Nishizaki, Shogo

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DISPLAY PANEL AND DISPLAY DEVICE INCLUDING THE SAME von Sung, SIJIN, Kim, Jaehyun, Park, Illsoo, Nishizaki, Shogo

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High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 µs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemi... von Ohdaira, Keisuke, Nishizaki, Shogo, Endo, Yohei, Fujiwara, Tomoko, Usami, Noritaka, Nakajima, Kazuo, Matsumura, Hideki

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Display device including a surface reinforcing layer formed by surface treatment of an organic insulating layer and method for manufacturing the same von Choi, Young Seo, Kim, Jae Hyun, Nishizaki, Shogo, Moon, Byung Rok

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DISPLAY DEVICE von JO, WONJE, KIM, JAEHYUN, NISHIZAKI, SHOGO, MOON, BYUNGROK, LEE, CHE HO

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