Analysis of organic multilayers and 3D structures using Ar cluster ions von Niehuis, E., Möllers, R., Rading, D., Cramer, H.-G., Kersting, R.

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Surface spectrometry using large argon clusters von Kayser, S., Rading, D., Moellers, R., Kollmer, F., Niehuis, E.

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Depth profiling of organic materials using improved ion beam conditions von Cramer, H.-G., Grehl, T., Kollmer, F., Moellers, R., Niehuis, E., Rading, D.

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Comparison of fullerene and large argon clusters for the molecular depth profiling of amino acid multilayers von Wehbe, N., Mouhib, T., Delcorte, A., Bertrand, P., Moellers, R., Niehuis, E., Houssiau, L.

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Organic depth profiling of C60 and C60/phthalocyanine layers using argon clusters von Mouhib, T., Poleunis, C., Möllers, R., Niehuis, E., Defrance, P., Bertrand, P., Delcorte, A.

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Dual beam depth profiling of organic materials: Variations of analysis and sputter beam conditions von Rading, D., Moellers, R., Kollmer, F., Paul, W., Niehuis, E.

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TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Ar+n, C+60 and Cs+ sputtering ions: A comparative study von WEHBE, N, TABARRANT, T, BRISON, J, MOUHIB, T, DELCORTE, A, BERTRAND, P, MOELLERS, R, NIEHUIS, E, HOUSSIAU, L

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TOF-SIMS depth profiling of multilayer amino-acid films using large Argon cluster Arn+, C60+ and Cs+ sputtering ions: A comparative study von Wehbe, N., Tabarrant, T., Brison, J., Mouhib, T., Delcorte, A., Bertrand, P., Moellers, R., Niehuis, E., Houssiau, L.

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Dual beam depth profiling of polymer materials: comparison of C60 and Ar cluster ion beams for sputtering von Rading, D., Moellers, R., Cramer, H.-G., Niehuis, E.

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Influence of primary ion bombardment conditions on the emission of molecular secondary ions von Kersting, R., Hagenhoff, B., Kollmer, F., Möllers, R., Niehuis, E.

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Surface characterization of nanoparticles: different surface analytical techniques compared von Kersting, R., Breitenstein, D., Hagenhoff, B., Fartmann, M., Heller, D., Grehl, T., Brüner, P., Niehuis, E.

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Low energy dual beam depth profiling: influence of sputter and analysis beam parameters on profile performance using TOF-SIMS von Grehl, T., Möllers, R., Niehuis, E.

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MCs+ depth profiling using cluster primary ions von Niehuis, E., Grehl, T., Kollmer, F., Moellers, R., Rading, D., Kersting, R., Hagenhoff, B.

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Novel Cluster Ion Beams For Secondary Ion Generation, Sputtering And FIB/SIMS Application von Kollmer, F., Rading, D., Moellers, R., Cramer, H., Paul, W., Niehuis, E.

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Improvement of Biological Time-of-Flight-Secondary Ion Mass Spectrometry Imaging with a Bismuth Cluster Ion Source von Touboul, David, Kollmer, Felix, Niehuis, Ewald, Brunelle, Alain, Laprévote, Olivier

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Dual beam depth profiling of polymer materials: comparison of C 60 and Ar cluster ion beams for sputtering von Rading, D., Moellers, R., Cramer, H.‐G., Niehuis, E.

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Chemical effects in C60 irradiation of polymers von MÖLLERS, R, TUCCITTO, N, TORRISI, V, NIEHUIS, E, LICCIARDELLO, A

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Organic depth profiling of C 60 and C 60 /phthalocyanine layers using argon clusters von Mouhib, T., Poleunis, C., Möllers, R., Niehuis, E., Defrance, P., Bertrand, P., Delcorte, A.

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Chemical effects in C 60 irradiation of polymers von Möllers, R., Tuccitto, N., Torrisi, V., Niehuis, E., Licciardello, A.

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High-spatial-resolution surface imaging of inorganic and organic structures by multiphoton post-ionization of sputtered neutrals and time-of-flight mass spectrometry von Tehorst, M., Möllers, R., Niehuis, E., Benninghoven, A.

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