(Invited) Development of CMOS-MEMS Cointegrated Pressure Sensor Using Minimal Fab Process von Liu, Yongxun, Akita, Ippei, Matsukawa, Takashi, Tanaka, Hiroyuki, Koga, Kazuhiro, Nemoto, Kazumasa, Khumpuang, Sommawan, Nagao, Masayoshi, Morita, Yukinori, Hara, Shiro

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Development of a wide variety of half-inch wafers that can be used in Minimal Fab von Nemoto, Kazumasa, Tanaka, Hiroyuki, Sakai, Takaaki, Kajikura, Atsushi, Yang, Zhen, Khumpuang, Sommawan, Hara, Shiro

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Study of TiN Gate SOI-CMOS process shrink by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro

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Fabrication and evaluation of diamond SBD using Minimal fab (III) von Watanabe, Hideyuki, Nemoto, Kazumasa, Miura, Noriko, Kase, Masashi, Yajima, Takashi, Noda, Shuichi, Umezawa, Hitoshi, Khumpuang, Sommawan, Hara, Shiro

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Device process of diamond Wafer using Minimal Fab(Ⅱ) von Nemoto, Kazumasa, Yajima, Takashi, Tanaka, Hiroyuki, Noda, Shuichi, Khumpuang, Sommawan, Hara, Shiro

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Fabrication and evaluation of diamond SBD using Minimal fab (II) von Watanabe, Hideyuki, Nemoto, Kazumasa, Yajima, Takashi, Noda, Shuichi, Imura, Fumito, Lozach, Mickael, Umezawa, Hitoshi, Khumpuang, Sommawan, Hara, Shiro

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Device process of diamond wafer using Minimal Fab(Ⅱ) von Nemoto, Kazumasa, Yajima, Takashi, Tanaka, Hiroyuki, Noda, Shuichi, Khumpuang, Sommawan, Hara, Shiro

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TiN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (4) von Noda, Shuichi, Koga, Kazuhiro, Imura, Fumito, Nemoto, Kazumasa, Yabuta, Yuuki, Naoko, Yamamoto, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

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Application of diamond wafer to Minimal Fab von Nemoto, Kazumasa, Tanaka, Hiroyuki, Noda, Shuichi, Miura, Noriko, Khumpuang, Sommawan, Hara, Shiro

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Considerations of ultrapure water quantity optimization for wafer cleaning von Kageyama, Tomoaki, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro, Lee, Sang-Seok

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Development of Liquid TEM Cell Fabrication Process Using Minimal Fab Tools von Liu, Yongxun, Murakami, Katsuhisa, Li, Xiaoguang, Nemoto, Kazumasa, Noda, Shuichi, Tanaka, Hiroyuki, Koga, Kazuhiro, Khumpuang, Sommawan, Morita, Yukinori, Matsukawa, Takashi, Hara, Shiro, Takeguchi, Masaki, Nagao, Masayoshi

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Fabrication of piezoresistive pressure sensor using minimal deep-RIE and mask aligner von Liu, Yongxun, Tanaka, Hiroyuki, Koga, Kazuhiro, Nemoto, Kazumasa, Khumpuang, Sommawan, Nagao, Masayoshi, Matsukawa, Takashi, Hara, Shiro

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Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (3) von Noda, Shuichi, Koga, Kazuhiro, Nemoto, Kazumasa, Yabuta, Yuuki, Yamamoto, Naoko, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

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Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2) von Noda, Shuichi, Koga, Kazuhiro, Nemoto, Kazumasa, Yabuta, Yuuki, Yamamoto, Naoko, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

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Variation of Electrical Characteristics of TiN-Gate SOI CMOS Fabricated by Minimal Fab von Koga, Kazuhiro, Y.X, Liu, Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro

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TiN-Gate SOI CMOS Fabricated by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro

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Study of TiN Gate SOI-CMOS process by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Somawan, Hara, Shiro

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Formation of TiN Films Using Minimal Sputtering Tool von Noda, Shuichi, Tanaka, Hiroyuki, Nemoto, Kazumasa, Koga, Kazuhiro, Yabuta, Yuki, Yamamoto, Naoko, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

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TiN Gate SOI pMOS Fabrication by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Somawan, Hara, Shiro

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WATER GAUGE SYSTEM von NEMOTO KAZUMASA

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