(Invited) Development of CMOS-MEMS Cointegrated Pressure Sensor Using Minimal Fab Process von Liu, Yongxun, Akita, Ippei, Matsukawa, Takashi, Tanaka, Hiroyuki, Koga, Kazuhiro, Nemoto, Kazumasa, Khumpuang, Sommawan, Nagao, Masayoshi, Morita, Yukinori, Hara, Shiro

Volltext

Development of a wide variety of half-inch wafers that can be used in Minimal Fab von Nemoto, Kazumasa, Tanaka, Hiroyuki, Sakai, Takaaki, Kajikura, Atsushi, Yang, Zhen, Khumpuang, Sommawan, Hara, Shiro

Volltext

Fabrication and evaluation of diamond SBD using Minimal fab (III) von Watanabe, Hideyuki, Nemoto, Kazumasa, Miura, Noriko, Kase, Masashi, Yajima, Takashi, Noda, Shuichi, Umezawa, Hitoshi, Khumpuang, Sommawan, Hara, Shiro

Volltext

Device process of diamond Wafer using Minimal Fab(Ⅱ) von Nemoto, Kazumasa, Yajima, Takashi, Tanaka, Hiroyuki, Noda, Shuichi, Khumpuang, Sommawan, Hara, Shiro

Volltext

Study of TiN Gate SOI-CMOS process shrink by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro

Volltext

Fabrication and evaluation of diamond SBD using Minimal fab (II) von Watanabe, Hideyuki, Nemoto, Kazumasa, Yajima, Takashi, Noda, Shuichi, Imura, Fumito, Lozach, Mickael, Umezawa, Hitoshi, Khumpuang, Sommawan, Hara, Shiro

Volltext

Device process of diamond wafer using Minimal Fab(Ⅱ) von Nemoto, Kazumasa, Yajima, Takashi, Tanaka, Hiroyuki, Noda, Shuichi, Khumpuang, Sommawan, Hara, Shiro

Volltext

Application of diamond wafer to Minimal Fab von Nemoto, Kazumasa, Tanaka, Hiroyuki, Noda, Shuichi, Miura, Noriko, Khumpuang, Sommawan, Hara, Shiro

Volltext

TiN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (4) von Noda, Shuichi, Koga, Kazuhiro, Imura, Fumito, Nemoto, Kazumasa, Yabuta, Yuuki, Naoko, Yamamoto, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

Volltext

Considerations of ultrapure water quantity optimization for wafer cleaning von Kageyama, Tomoaki, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro, Lee, Sang-Seok

Volltext

Development of Liquid TEM Cell Fabrication Process Using Minimal Fab Tools von Liu, Yongxun, Murakami, Katsuhisa, Li, Xiaoguang, Nemoto, Kazumasa, Noda, Shuichi, Tanaka, Hiroyuki, Koga, Kazuhiro, Khumpuang, Sommawan, Morita, Yukinori, Matsukawa, Takashi, Hara, Shiro, Takeguchi, Masaki, Nagao, Masayoshi

Volltext

Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (3) von Noda, Shuichi, Koga, Kazuhiro, Nemoto, Kazumasa, Yabuta, Yuuki, Yamamoto, Naoko, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

Volltext

Fabrication of piezoresistive pressure sensor using minimal deep-RIE and mask aligner von Liu, Yongxun, Tanaka, Hiroyuki, Koga, Kazuhiro, Nemoto, Kazumasa, Khumpuang, Sommawan, Nagao, Masayoshi, Matsukawa, Takashi, Hara, Shiro

Volltext

Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (2) von Noda, Shuichi, Koga, Kazuhiro, Nemoto, Kazumasa, Yabuta, Yuuki, Yamamoto, Naoko, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

Volltext

Variation of Electrical Characteristics of TiN-Gate SOI CMOS Fabricated by Minimal Fab von Koga, Kazuhiro, Y.X, Liu, Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro

Volltext

TiN-Gate SOI CMOS Fabricated by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Sommawan, Hara, Shiro

Volltext

Formation of TiN Films Using Minimal Sputtering Tool von Noda, Shuichi, Tanaka, Hiroyuki, Nemoto, Kazumasa, Koga, Kazuhiro, Yabuta, Yuki, Yamamoto, Naoko, Kamei, Ryuichiro, Khumpuang, Sommawan, Hara, Shiro

Volltext

TiN Gate SOI pMOS Fabrication by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Somawan, Hara, Shiro

Volltext

Study of TiN Gate SOI-CMOS process by minimal fab von Koga, Kazuhiro, Liu, Y. X., Imura, Fumito, Kase, Masashi, Noda, Shuichi, Nemoto, Kazumasa, Khumpuang, Somawan, Hara, Shiro

Volltext

Wet cleaning to reduce particles generated on a wafer in closed environment von Nemoto, Kazumasa, Yajima, Takashi, Noriko, Miura, Khumpuang, Sommawan, Hara, Shiro

Volltext