Power scaling of an extreme ultraviolet light source for future lithography von Wagenaars, Erik, Küpper, Felix, Klein, Jürgen, Neff, Willi, Damen, Marcel, van der Wel, Pieter, Vaudrevange, Dominik, Jonkers, Jeroen

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Reduction of Bacillus Subtilis and Aspergillus Niger spores using nonthermal atmospheric gas discharges von Trompeter, F.-J., Neff, W.J., Franken, O., Heise, M., Neiger, M., Shuhai Liu, Pietsch, G.J., Saveljew, A.B.

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Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma von Bergmann, Klaus, Schriever, Guido, Rosier, Oliver, Müller, Martin, Neff, Willi, Lebert, Rainer

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Extreme Ultraviolet Plasma Source for Future Lithography: Images in Plasma Science von WAGENAARS, Erik, MADER, Arnaud, BERGMANN, Klaus, JONKERS, Jeroen, NEFF, Willi

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Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency von Bergmann, K, Rosier, O, Neff, W, Lebert, R

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Requirements for simultaneous ignition of all channels in a high-current radial multichannel pseudospark switch von Naweed, A., Kiefer, J., Neff, W.J., Lebert, R.

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Extreme Ultraviolet Plasma Source For Future Lithography von Wagenaars, E., Mader, A., Bergmann, K., Jonkers, J., Neff, W.

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Analysis of the hollow cathode emitted electron beams in a radial multichannel pseudospark von Kiefer, J., Neff, W.J., Lebert, R., Naweed, A.

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Frequency scaling in a hollow-cathode-triggered pinch plasma as radiation source in the extreme ultraviolet von Rosier, O., Apetz, R., Bergmann, K., Jonkers, J., Wester, R., Neff, W., Pankert, J.

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A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography von Bergmann, Klaus, Rosier, Oliver, Lebert, Rainer, Neff, Willi, Poprawe, Reinhart

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Arc erosion characteristics of pseudospark discharge in multiaperture geometry von Naweed, Ahmer, Kiefer, Jochen, Gavrilescu, Constantin, Neff, Willi

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Arrangement and method for protecting an optical component, particularly in an EUV source von NEFF, WILLI, LOEKEN, MICHAEL

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Frequency scaling in a hollow-cathode-triggered pinch plasma as radiation source in the extreme ultraviolet: Special issue on pseudospark physics and applications von ROSIER, Oliver, APETZ, Rolf, BERGMANN, Klaus, JONKERS, Jeroen, WESTER, Rolf, NEFF, Willi, PANKERT, Joseph

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Gasentladungsquelle, insbesondere für EUV-Strahlung von NEFF, WILLI

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Articles coated with crack resistant fluorine annealed films and methods of manufacture von NEFF, WILLI, S.J.ANGELONI, GUNDA NILESH, LAO JIJUN

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Reduction of Bacillus Subtilis and Aspergillus Niger spores using nonthermal atmospheric gas discharges: Special issue on nonthermal medical/biological applications of ionized gase... von TROMPETER, Franz-Josef, NEFF, Willi J, FRANKEN, Oliver, HEISE, Michael, NEIGER, Manfred, SHUHAI LIU, PIETSCH, Gerhard J, SAVELJEW, Anatoli B

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Inductively coupled plasma light source von NEFF, WILLI, SAITO KATHRYN, GRZYBINSKI RZEMYSLAW MICHAL, HORN STEPHEN F, RODERICK MICHAEL J

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Electrode phenomena and lifetime considerations in a radial multichannel pseudospark switch von Bergmann, K., Muller, M., Reichartz, D., Neff, W., Lebert, R.

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Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung von NEFF, WILLI, PRUEMMER, RALF

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Extreme UV and soft X ray generator von BERGMANN KLAUS, NEFF WILLI

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