Sub-10 nm Features Obtained from Directed Self-Assembly of Semicrystalline Polycarbosilane-Based Block Copolymer Thin Films von Aissou, Karim, Mumtaz, Muhammad, Fleury, Guillaume, Portale, Giuseppe, Navarro, Christophe, Cloutet, Eric, Brochon, Cyril, Ross, Caroline A., Hadziioannou, Georges

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Ring-Opening Polymerization of Trimethylene Carbonate Catalyzed by Methanesulfonic Acid: Activated Monomer versus Active Chain End Mechanisms von Delcroix, Damien, Martín-Vaca, Blanca, Bourissou, Didier, Navarro, Christophe

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Assessing the Local Nanomechanical Properties of Self-Assembled Block Copolymer Thin Films by Peak Force Tapping von Lorenzoni, Matteo, Evangelio, Laura, Verhaeghe, Sophie, Nicolet, Célia, Navarro, Christophe, Pérez-Murano, Francesc

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Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line–Space Patterning von Legrain, Antoine, Fleury, Guillaume, Mumtaz, Muhammad, Navarro, Christophe, Arias-Zapata, Javier, Chevalier, Xavier, Cayrefourcq, Ian, Zelsmann, Marc

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Nanoscale Block Copolymer Ordering Induced by Visible Interferometric Micropatterning: A Route towards Large Scale Block Copolymer 2D Crystals von Aissou, Karim, Shaver, Jonah, Fleury, Guillaume, Pécastaings, Gilles, Brochon, Cyril, Navarro, Christophe, Grauby, Stéphane, Rampnoux, Jean-Michel, Dilhaire, Stefan, Hadziioannou, Georges

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Chemistry and Mechanical Properties of Epoxy-Based Thermosets Reinforced by Reactive and Nonreactive SBMX Block Copolymers von Rebizant, Valéry, Venet, Anne-Sophie, Tournilhac, François, Girard-Reydet, Emmanuel, Navarro, Christophe, Pascault, Jean-Pierre, Leibler, Ludwik

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Probing Self-Assembly of Cylindrical Morphology Block Copolymer Using in Situ and ex Situ Grazing Incidence Small-Angle X‑ray Scattering: The Attractive Case of Graphoepitaxy von Maret, Mireille, Tiron, Raluca, Chevalier, Xavier, Gergaud, Patrice, Gharbi, Ahmed, Lapeyre, Céline, Pradelles, Jonathan, Jousseaume, Vincent, Fleury, Guillaume, Hadziioannou, Georges, Boudet, Nathalie, Navarro, Christophe

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Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study von Tiron, Raluca, Chevalier, Xavier, Couderc, Christophe, Pradelles, Jonathan, Bustos, Jessy, Pain, Laurent, Navarro, Christophe, Magnet, Stephanie, Fleury, Guillaume, Hadziioannou, Georges

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Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers von Chevalier, Xavier, Correia, Cindy Gomes, Pound-Lana, Gwenaelle, Bézard, Philippe, Sérégé, Matthieu, Petit-Etienne, Camille, Gay, Guillaume, Cunge, Gilles, Cabannes-Boué, Benjamin, Nicolet, Célia, Navarro, Christophe, Cayrefourcq, Ian, Müller, Marcus, Hadziioannou, Georges, Iliopoulos, Ilias, Fleury, Guillaume, Zelsmann, Marc

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Recent Achievements in Sub-10 nm DSA Lithography for Line/Space Patterning von Navarro, Christophe, Nicolet, Celia, Ariura, Fumi, Chevalier, Xavier, Xu, Kui, Hockey, Mary Ann, Mumtaz, Muhammad, Fleury, Guillaume, Hadziioannou, Georges, Legrain, Antoine, Zelsmann, Marc, Gharbi, Ahmed, Tiron, Raluca, Pain, Laurent, Evangelio, Laura, Fernandez-Regulez, Marta, Perez-Murano, Francesc, Cayrefourcq, Ian

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Advanced Formulation for DSA Resists von Nicolet, Celia, Chevalier, Xavier, Beausoleil, Julien, Sakavuyi, Kaumba, Berron, John, Brakensiek, Nick, Jurajda, Darron, Navarro, Christophe, Cayrefourcq, Ian

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Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line von Servin, Isabelle, Tiron, Raluca, Gharbi, Ahmed, Argoud, Maxime, Jullian, Karine, Chamiot-Maitral, Gaëlle, Barros, Patricia Pimenta, Chevalier, Xavier, Belledent, Jérôme, Bossy, Xavier, Moulis, Sylvain, Navarro, Christophe, Cunge, Gilles, Barnola, Sébastien, Asai, Masaya, Pieczulewski, Charles

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Block copolymer technology applied to nanoelectronics von Tallegas, Salomé, Baron, Thierry, Gay, Guillaume, Aggrafeil, Claire, Salhi, Billel, Chevolleau, Thierry, Cunge, Gilles, Bsiesy, Ahmad, Tiron, Raluca, Chevalier, Xavier, Navarro, Christophe, Aissou, Karim, Otsuka, Issei, Halila, Sami, Fort, Sébastien, Borsali, Redouane

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Reducing the crystallinity of PCL chains by copolymerization with substituted δ/ε-lactones and its impact on the phase separation of PCL-based block copolymers von Kayser, Franck, Fleury, Guillaume, Thongkham, Somprasong, Navarro, Christophe, Martin-Vaca, Blanca, Bourissou, Didier

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Microphase Separation of Polybutyrolactone-Based Block Copolymers with Sub-20 nm Domains von Kayser, Franck, Fleury, Guillaume, Thongkham, Somprasong, Navarro, Christophe, Martin-Vaca, Blanca, Bourissou, Didier

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Reducing the crystallinity of PCL chains by copolymerization with substituted δ/ -lactones and its impact on the phase separation of PCL-based block copolymers von Kayser, Franck, Fleury, Guillaume, Thongkham, Somprasong, Navarro, Christophe, Martin-Vaca, Blanca, Bourissou, Didier

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Phosphoric and phosphoramidic acids as bifunctional catalysts for the ring-opening polymerization of ε-caprolactone: a combined experimental and theoretical study von Delcroix, Damien, Couffin, Aline, Susperregui, Nicolas, Navarro, Christophe, Maron, Laurent, Martin-Vaca, Blanca, Bourissou, Didier

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Self-organization and dewetting kinetics in sub-10 nm diblock copolymer line/space lithography von Chevalier, Xavier, Pound-Lana, Gwenaelle, Gomes Correia, Cindy, Cavalaglio, Sébastien, Cabannes-Boué, Benjamin, Restagno, Frédéric, Miquelard-Garnier, Guillaume, Roland, Sébastien, Navarro, Christophe, Fleury, Guillaume, Zelsmann, Marc

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Mild and Efficient Preparation of Block and Gradient Copolymers by Methanesulfonic Acid Catalyzed Ring-Opening Polymerization of Caprolactone and Trimethylene Carbonate von Couffin, Aline, Delcroix, Damien, Martín-Vaca, Blanca, Bourissou, Didier, Navarro, Christophe

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Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application von Gusmão Cacho, Maria Gabriela, Benotmane, Khatia, Pimenta-Barros, Patricia, Bouet, Charlotte, Rademaker, Guido, Argoud, Maxime, Navarro, Christophe, Tiron, Raluca, Possémé, Nicolas

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