Overlay improvement in nanoimprint lithography for 1×-nm patterning von Fukuhara, Kazuya, Suzuki, Masato, Mitsuyasu, Masaki, Komukai, Toshiaki, Hatano, Masayuki, Kono, Takuya, Nakasugi, Tetsuro, Lim, Yonghyun, Jung, Wooyung, Nakamae, Koji

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Defect Inspection Technique Using Surface Plasmon Resonance von Kashiwagi, Hiroyuki, Yoneda, Ikuo, Morishita, Keiko, Yoshikawa, Ryoji, Hirano, Takashi, Nakasugi, Tetsuro

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Defect Inspection Technique Using Surface Plasmon Resonance von Kashiwagi, Hiroyuki, Yoneda, Ikuo, Morishita, Keiko, Yoshikawa, Ryoji, Hirano, Takashi, Nakasugi, Tetsuro

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High Resolution Positive-Working Molecular Resist Derived from Truxene von Hattori, Shigeki, Yamada, Arisa, Saito, Satoshi, Asakawa, Koji, Koshiba, Takeshi, Nakasugi, Tetsuro

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Development of High Resolution Molecular Resist Based on Tris((hydroxypheny)pheny)benzene von Yamada, Arisa, Hattori, Shigeki, Saito, Satoshi, Asakawa, Koji, Yoneda, Ikuo, Nakasugi, Tetsuro

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Meniscus behavior under helium exposure for rapid resist spreading during nanoimprint lithography von Kashiwagi, Hiroyuki, Sato, Nobuyoshi, Hatano, Masayuki, Jung, Wooyung, Kono, Takuya, Nakasugi, Tetsuro

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A Development of Photoresist Material for Low Energy Electron Beam Lithography von Saito, Satoshi, Nakasugi, Tetsuro

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Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation von Nakasugi, Tetsuro, Ando, Atsushi, Inanami, Ryoichi, Sasaki, Noriaki, Sugihara, Kazuyoshi, Miyoshi, Motosuke, Fujioka, Hiromu

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Proximity effect correction for electron beam lithography : Highly accurate correction method von KAMIKUBO, T, ABE, T, TOJO, T, OOGI, S, ANZE, H, SHIMIZU, M, ITOH, M, NAKASUGI, T, TAKIGAWA, T, IIJIMA, T, HATTORI, Y

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Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match von Ryoichi Inanami, Ryoichi Inanami, Tetsuro Nakasugi, Tetsuro Nakasugi, Shinji Sato, Shinji Sato, Shoji Mimotogi, Shoji Mimotogi, Satoshi Tanaka, Satoshi Tanaka, Kazuyoshi Sugihara, Kazuyoshi Sugihara

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Fabrication of micro-marks for electron-beam lithography von TAKAMATSU, J, NAKASUGI, T, KATO, Y, SHIMOMURA, N, SUNAOSHI, H, HATTORI, K, NAKAJIMA, K, SUGIHARA, K, TAKIGAWA, T

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Optimization of a high-performance chemically amplified positive resist for electron-beam lithography von NAKASUGI, T, TAMURA, H, NIIYAMA, H, SAITO, S, KIHARA, N, NAITO, T, NAKASE, M

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Charge-reducing Effect of Chemically Amplified Resist in Electron-Beam Lithography von Nakasugi, Tetsuro, Magoshi, Shunko, Sugihara, Kazuyoshi, Saito, Satoshi, Kihara, Naoko

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IMPRINT METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE von FUKUHARA, Kazuya, HATANO, Masayuki, NAKASUGI, Tetsuro

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Imprint apparatus, imprint method, and manufacturing method of semiconductor device von Nakasugi, Tetsuro, Hatano, Masayuki, Kobayashi, Kei

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Imprint apparatus, imprint method, and method of manufacturing semiconductor device von Nakasugi, Tetsuro, Hatano, Masayuki, Fukuhara, Kazuya

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Novel electron beam resist material using hydrophilic protecting group von Saito, Satoshi, Nakasugi, Tetsuro

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IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE von KOBAYASHI, Kei, HATANO, Masayuki, NAKASUGI, Tetsuro

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Imprint apparatus and imprint method von Suzuki, Masato, Kono, Takuya, Nakasugi, Tetsuro, Mitsuyasu, Masaki, Fukuhara, Kazuya

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Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution von Magoshi, Shunko, Niiyama, Hiromi, Sato, Shinji, Kato, Yoshimitsu, Watanabe, Yumi, Shibata, Tohru, Ito, Masamitsu, Ando, Atsushi, Nakasugi, Tetsuro, Sugihara, Kazuyoshi, Okumura, Katsuya

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