The Photopolymer Science and Technology Award von Nakase, Makoto

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Highly transparent chemically amplified ArF excimer laser resists by absorption band shift for 193 nm wavelength von NAITO, T, ASAKAWA, K, SHIDA, N, USHIROGOUCHI, T, NAKASE, M

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Dissolution inhibitors for 193-nm chemically amplified resists von USHIROGOUCHI, T, ASAKAWA, K, OKINO, T, SHIDA, N, KIHARA, N, NAKASE, M

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NOVEL ArF EXCIMER LASER RESISTS BASED ON MENTHYL METHACRYLATE TERPOLYMER von SHIDA, Naomi, USHIROGOUCHI, Tohru, ASAKAWA, Kohji, NAKASE, Makoto

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EB Resist Materials Consist of Catechol Derivatives von Kihara, Naoko, Saito, Satoshi, Ushirogouchi, Tohru, Nakase, Makoto

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Thermal Decomposition of Dissolution Inhibitor in Chemically Amplified Resist during Prebake Process von Saito, Satoshi, Kihara, Naoko, Wakabayashi, Hiromitsu, Makoto Nakase, Makoto Nakase

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Simulation study on phase-shifting masks for isolated patterns von INOUE, S, TANAKA, Y, SATO, T, TAMAMUSHI, S, NAKASE, M

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KrF excimer laser process : lateral and surface modification for enhancing resist contrast von MINAMIYAMA, T, KUMAGAE, A, SATO, K, ITO, S, NAKASE, M

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Optimization of a high-performance chemically amplified positive resist for electron-beam lithography von NAKASUGI, T, TAMURA, H, NIIYAMA, H, SAITO, S, KIHARA, N, NAITO, T, NAKASE, M

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Recent Progress in ULSI Lithography von Nakase, Makoto

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Simulation of Light Scattering and Determination of the MTF of Positive Photoresists using the Monte Carlo Method von Nakase, Makoto

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Study of Copolymer Properties for ArF Excimer Laser Resists von Asakawa, Koji, Ushirogouchi, Tohru, Shida, Naomi, Okino, Takeshi, Nakase, Makoto

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Chemically amplified resist using self-solubility acceleration effect von KIHARA, N, USHIROGOUCHI, T, TADA, T, NAITO, T, SAITO, S, NAKASE, M

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ENVIRONMENTALLY FRIENDLY WATER-SOLUBLE RESISTS VIA CHEMICAL AMPLIFICATION von SHIDA, Naomi, USHIROGOUCHI, Tohru, NAKASE, Makoto

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EFFECT OF ACID EVAPORATION IN CHEMICALLY AMPLIFIED RESISTS ON INSOLUBLE LAYER FORMATION von KIHARA, NAOKO, SAITO, SATOSHI, USHIROGOUCHI, TOHRU, NAKASE, MAKOTO

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Inhibition and Promotion Efficiency of Bis-phenol Type Dissolution Inhibitors During Development von Kihara, Naoko, Saito, Satoshi, Naito, Takuya, Ushirogouchi, Tohru, Asakawa, Koji, Nakase, Makoto

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Effect of Coherence Factor σ and Shifter Arrangement for the Levenson-Type Phase-Shifting Mask von Hashimoto, Kohji, Kawano, Kenji, Inoue, Soichi, Nakase, Shinichi Itoh

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HIGH PERFORMANCE CHEMICALLY AMPLIFIED POSITIVE ELECTRON-BEAM RESIST: OPTIMIZATION OF BASE ADDITIVES FOR ENVIRONMENTAL STABILIZATION von SAITO, SATOSHI, KIHARA, NAOKO, NAITO, TAKUYA, NAKASE, MAKOTO, NAKASUGI, TETSURO, KATO, YOSHIMITSU

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Molecular Design of Acid Generators for EB and ArF Excimer Laser Exposure Using Molecular Orbital Calculations von Ushirogouchi, Tohru, Kihara, Naoko, Saito, Satoshi, Naito, Takuya, Asakawa, Koji, Tada, Tsukasa, Nakase, Makoto

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Recent Progress in ULSI Lithography von Nakase, Makoto

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