Effect of Stacking Faults in Triangular Defects on 4H-SiC Junction Barrier Schottky Diodes von Konishi, Kazuya, Nakata, Shuhei, Nakaki, Yoshiyuki, Nakao, Yukiyasu, Nagae, Akemi, Tanaka, Takanori, Nakamura, Yu, Toyoda, Yoshihiko, Sumitani, Hiroaki, Oomori, Tatsuo

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Designing and Fabrication of the VLD Edge Termination for 3.3 kV SiC SBD von Yamamoto, Yasuki, Aya, Sunao, Nakata, Shuhei, Toyoda, Yoshihiko, Yamakawa, Satoshi, Ebihara, Kohei, Imaizumi, Masayuki, Nakaki, Yoshiyuki

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Characteristics of a Schottky Barrier Diode and the SiC Wafers Sliced by Wire Electrical Discharge Machining von Sumitani, Hiroaki, Itokazu, Atsushi, Miyake, Hidetaka, Tomita, Nobuyuki, Furusho, Tomoaki, Toyoda, Yoshihiko, Hashimoto, Takashi, Yamakawa, Satoshi, Kuroiwa, Takeharu, Nakaki, Yoshiyuki, Sato, Tatsushi

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Edge Recording on Direct Overwrite Exchange-Coupled Multilayer Media von FUkami, Tatsuya, Nakaki, Yoshiyuki, Tokunaga, Takashi, Yuji Kawano, Yuji Kawano, Kazuhiko Tsutsumi, Kazuhiko Tsutsumi

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SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME von NAKAKI YOSHIYUKI

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SILICON CARBIDE SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR von NAKAKI YOSHIYUKI

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AN EVALUATION METHOD OF RECORDING CHARACTERISTICS OF THE LIGHT INTENSITY MODULATION DIRECT OVERWRITE (DOW) von ITO, Masaya, NAKAKI, Yoshiyuki, TSUTSUMI, Kazuhiko, ITO, Osamu

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Thermal-type infrared image sensing device and method of producing the same von Nakaki, Yoshiyuki

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Thermal-type infrared image sensing device and method of producing the same von NAKAKI YOSHIYUKI

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METHOD FOR MANUFACTURING INFRARED SENSOR von NAKAKI YOSHIYUKI

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INFRARED IMAGING DEVICE AND ITS MANUFACTURING METHOD von NAKAKI YOSHIYUKI

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INFRARED IMAGING SENSOR AND METHOD OF PRODUCING THE SAME von NAKAKI YOSHIYUKI

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THERMAL-TYPE INFRARED IMAGE SENSING DEVICE AND METHOD OF PRODUCING THE SAME von NAKAKI YOSHIYUKI

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A new direct overwrite method by light intensity modulation with multi layered magneto-optical discs von FUKAMI, T, NAKAKI, Y, TOKUNAGA, T, TAGUCHI, M, TSUTSUMI, K, SUGAHARA, H

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Verfahren zum Herstellen einer Halbleitervorrichtung von Nakaki, Yoshiyuki, Terai, Mamoru, Idaka, Shiori, Suehiro, Yoshiyuki

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Semiconductor device and method of manufacturing the same von TERAI MAMORU, NAKAKI YOSHIYUKI, SUEHIRO YOSHIYUKI, IDAKA SHIORI

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Semiconductor apparatus and method for producing the same von Terai Mamoru, Idaka Shiori, Yamamoto Kei, Nakaki Yoshiyuki

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Halbleitervorrichtung und Verfahren zu ihrer Herstellung von Nakaki, Yoshiyuki, Yamamoto, Kei, Terai, Mamoru, Idaka, Shiori

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Semiconductor Device and Method of Manufacturing the Same von TERAI MAMORU, NAKAKI YOSHIYUKI, SUEHIRO YOSHIYUKI, IDAKA SHIORI

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Halbleitervorrichtung von Furukawa, Akihiko, Nakaki, Yoshiyuki, Miura, Naruhisa, Kawakami, Tsuyoshi, Hamada, Kenji, Kagawa, Yasuhiro

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