Treffer 1 - 20 von 332 für Suche 'NAGAI, Ryu', Suchdauer: 0,76s Treffer weiter einschränken
  1. 1
    Effect of Intermediate-Range Structure on Negative Electrode Properties of Wadsley–Roth Phase Ti2Nb10O29

    Effect of Intermediate-Range Structure on Negative Electrode Properties of Wadsley–Roth Phase Ti2Nb10O29 von KITAMURA, Naoto, NAGAI, Ryu, ISHIBASHI, Chiaki, IDEMOTO, Yasushi


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  2. 2
    Non uniform thermal oxidation of SiC and its impact on electrical characteristics

    Non uniform thermal oxidation of SiC and its impact on electrical characteristics von Nagai, Ryu, Hasunuma, Ryu, Yamabe, Kikuo


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  3. 3
    Rapid wavelength scanning based on acousto-optically tuned external-cavity laser diode

    Rapid wavelength scanning based on acousto-optically tuned external-cavity laser diode von Suzuki, Takamasa, Nagai, Ryu-ichi, Sasaki, Osami, Choi, Samuel

    Veröffentlicht in Optics communications

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  4. 4
    Effect of Intermediate-Range Structure on Negative Electrode Properties of Wadsley–Roth Phase Ti2Nb10O29

    Effect of Intermediate-Range Structure on Negative Electrode Properties of Wadsley–Roth Phase Ti2Nb10O29 von KITAMURA, Naoto, NAGAI, Ryu, ISHIBASHI, Chiaki, IDEMOTO, Yasushi

    Veröffentlicht in Electrochemistry

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  5. 5
    Interfacial Transitional Layer in SiO 2 Film Thermally Grown on SiC(000-1)

    Interfacial Transitional Layer in SiO 2 Film Thermally Grown on SiC(000-1) von Nagai, Ryu, Iitsuka, Nozomu, Ozawa, Kodai, Hasunuma, Ryu, Yamabe, Kikuo

    Veröffentlicht in ECS transactions

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  6. 6
    Interfacial Transitional Layer in SiO2 Film Thermally Grown on SiC(000-1)

    Interfacial Transitional Layer in SiO2 Film Thermally Grown on SiC(000-1) von Nagai, Ryu, Iitsuka, Nozomu, Ozawa, Kodai, Hasunuma, Ryu, Yamabe, Kikuo


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  7. 7
    Analysis device and analysis method

    Analysis device and analysis method von Tanaka, Koki, Nagai, Ryu

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  8. 8
    Non-uniform layer near thermal SiO2/SiC interface and its impact on the leakage characteristics

    Non-uniform layer near thermal SiO2/SiC interface and its impact on the leakage characteristics von Nagai, Ryu, Hasunuma, Ryu, Yamabe, Kikuo


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  9. 9
    Characterization of thermal SiO2/SiC interfacial transitional layer

    Characterization of thermal SiO2/SiC interfacial transitional layer von Nagai, Ryu, Hasunuma, Ryu, Yamabe, Kikuo


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  10. 10
    Roughness Growth during Step-Etching on Thermal Oxide Surface of SiC

    Roughness Growth during Step-Etching on Thermal Oxide Surface of SiC von Nagai, Ryu, Iitsuka, Nozomu, Hasunuma, Ryu, Yamabe, Kikuo


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  11. 11
    Characterization of Thermal Oxide film quality in the vicinity of SiO2/SiC interface

    Characterization of Thermal Oxide film quality in the vicinity of SiO2/SiC interface von Nagai, Ryu, Iitsuka, Nozomu, Hasunuma, Ryu, Yamabe, Kikuo


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  12. 12
    Roughness Growth on Wet Oxide Surface and Interface of SiC

    Roughness Growth on Wet Oxide Surface and Interface of SiC von Kawamura, Hiroaki, Nagai, Ryu, Hasunuma, Ryu, Yamabe, Kikuo


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  13. 13
    ANALYSIS DEVICE AND ANALYSIS METHOD

    ANALYSIS DEVICE AND ANALYSIS METHOD von TANAKA, Koki, NAGAI, Ryu

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  14. 14
    ETCHING METHOD AND PLASMA PROCESSING APPARATUS

    ETCHING METHOD AND PLASMA PROCESSING APPARATUS von KAKO, Takashi, TANAKA, Koki, NAGAI, Ryu

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  15. 15
    PLASMA PROCESSING DEVICE AND END POINT DETECTION METHOD

    PLASMA PROCESSING DEVICE AND END POINT DETECTION METHOD von KOSHIMIZU, Chishio, NAGAI, Ryu

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  16. 16
    SUBSTRATE PROCESSING SYSTEM, INFORMATION PROCESSING APPARATUS, AND INFORMATION PROCESSING METHOD

    SUBSTRATE PROCESSING SYSTEM, INFORMATION PROCESSING APPARATUS, AND INFORMATION PROCESSING METHOD von AKAHANE, Shuhei, TANAKA, Koki, NAGAI, Ryu

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  17. 17
    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD von TANAKA, Koki, NAGAI, Ryu

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  18. 18
    ETCHING METHOD AND PLASMA PROCESSING APPARATUS

    ETCHING METHOD AND PLASMA PROCESSING APPARATUS von TANAKA, Ikko, TANAKA, Koki, NAGAI, Ryu, YOKOI, Masahiko, SUDA, Ryutaro

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  19. 19
    ANALYSIS DEVICE, PLASMA PROCESS CONTROL SYSTEM, AND RECORDING MEDIUM

    ANALYSIS DEVICE, PLASMA PROCESS CONTROL SYSTEM, AND RECORDING MEDIUM von AKAHANE, Shuhei, TANAKA, Koki, NAGAI, Ryu

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  20. 20
    ETCHING METHOD AND PLASMA PROCESSING APPARATUS

    ETCHING METHOD AND PLASMA PROCESSING APPARATUS von TANAKA, Koki, NAGAI, Ryu, ORUI, Takatoshi, SUDA, Ryutaro

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