Kinetics of Silicon Etching in Trifluoromethane Plasma von Pivovarenok, S. A., Murin, D. B.

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The Importance of Taking into Account the Heterogeneous Recombination of Atoms when Studying the Kinetics of Copper Etching in Chlorine Plasma von Sitanov, D. V., Pivovarenok, S. A., Murin, D. B.

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Influence of Mixture Composition on Electrophysical Parameters and Emission Spectra of Trifluoromethane Plasma with Oxygen and Argon von Pivovarenok, S. A., Murin, D. B., Grazhdyan, A. Yu

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Influence of Mixture Composition on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane and Trifluoromethane Plasma with Nitrogen von Pivovarenok, S. A., Murin, D. B., Grazhdyan, A. Yu

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Structuring Silicon in a High-Frequency Discharge of Freon R-23 von Dunaev, A. V., Murin, D. B.

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Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma von Murin, D. B., Grazhdyan, A. Yu, Chesnokov, I. A., Gogulev, I. A.

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Probe and Spectral Diagnostics of the Plasma of the BCl3–Cl2 Gas Medium von Murin, D. B., Chesnokov, I. A., Gogulev, I. A., Grishkov, A. E.

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Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane von Murin, D. B., Chesnokov, I. A., Gogulev, I. A., Grishkov, A. E.

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Plasma-Chemical and Reactive-Ion Etching of Silicon in Tetrafluoromethane with Argon von Murin, D. B., Pivovarenok, S. A., Kozin, A. S.

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Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy von Murin, D. B., Chesnokov, I. A., Pivovarenok, S. A., Efremov, A. M.

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Plasma-Chemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium von Murin, D. B., Chesnokov, I. A., Gogulev, I. A., Anokhin, A. L., Moloskin, A. E.

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Electrophysical Parameters and Emission Spectra of a DC Glow Discharge in the Freon R-23 Medium von Murin, D. B., Pivovarenok, S. A., Malyugin, A. A., Bobylev, A. V.

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Effect of a Mixture’s Composition on the Electrophysical Parameters and Emission Spectra of Hydrogen Chloride Plasma with Chlorine and Helium von Pivovarenok, S. A., Murin, D. B., Sitanov, D. V.

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Electrophysical Characteristics and Emission Spectra of Carbon Tetrafluoride Plasma von Murin, D. B., Pivovarenok, S. A., Chesnokov, I. A., Gogulev, I. A.

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Study of Gallium Arsenide Etching in a DC Discharge in Low-Pressure HCl-Containing Mixtures von Dunaev, A. V., Murin, D. B.

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Plasma Parameters and Kinetics of Active Particles in the Mixture CHF3 + O2 + Ar von Efremov, A. M., Murin, D. B., Kwon, K.-H.

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Kinetics of the Volumetric and Heterogeneous Processes in the Plasma of a C4F8 + O2 + Ar Mixture von Efremov, A. M., Murin, D. B., Sobolev, A. M., Kwon, K.-H.

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Spectral Control of the Process of Copper Etching in Radio Frequency Dichlorodifluoromethane Plasma von Murin, D. B., Pivovarenok, S. A., Dunaev, A. V., Chesnokov, I. A., Gogulev, I. A.

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Etching of GaAs in the Plasma of a Freon R-12–Argon (CCl2F2/Ar) Mixture von Murin, D. B., Dunaev, A. V.

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Special Aspects of the Kinetics of Reactive Ion Etching of SiO2 in Fluorine-, Chlorine-, and Bromine-Containing Plasma von Efremov, A. M., Murin, D. B., Betelin, V. B., Kwon, K.-H.

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