A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography von Brodie, I., Westerberg, E.R., Cone, D.R., Muray, J.J., Williams, N., Gasiorek, L.

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Energy Sensitive Thin-Film Counters for Ultra-Relativistic Particles von Inman, F. W., Muray, J. J.

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Magnetic Field Measurement and Spectroscopy in Multipole Fields von Cobb, J. K., Muray, J. J.

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Precision Measurements in Time-Varying Magnetic Fields von Muray, J. J., Scholl, R. A.

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Laser beam-induced electron and ion emission from metal foils von Cobb, J K, Muray, J J

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Secondary Emission from Thin Metal Foils Bombarded with 70-MeV Electrons von Blankenburg, S. A., Cobb, J. K., Muray, J. J.

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High Repetition Rate Pulsers for Beam Switching Magnets von Cole, J. L., Lutz, I. C., Muray, J. J.

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Magnetic center location in multipole fields von Cobb, J.K., Muray, J.J.

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Transition Radiation from Relativistic Electrons Crossing Dielectric Boundaries von Inman, Fred W., Muray, J. J.

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Efficiency of secondary electron emission monitors for 70 MeV electrons von Blankenburg, S.A., Cobb, J.K., Muray, J.J.

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