Etching Mechanisms of SiO2 and SiNx:H Thin Films in HF/Ethanol Vapor Phase: Toward High Selectivity Batch Release Processes von Guillemin, S., Mumbauer, P., Radtke, H., Fimberger, M., Fink, S., Kraxner, J., Faes, A., Siegert, J.

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Etching Mechanisms of SiO 2 and SiN x :H Thin Films in HF/Ethanol Vapor Phase: Toward High Selectivity Batch Release Processes von Guillemin, S., Mumbauer, P., Radtke, H., Fimberger, M., Fink, S., Kraxner, J., Faes, A., Siegert, J.

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Studies of solution processed metal oxides on silicon von Shanmugasundaram, K., Brubaker, M., Chang, K., Mumbauer, P., Roman, P., Ruzyllo, J.

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Silicon surface treatments in advanced MOS gate processing von Chang, K., Shanmugasundaram, K., Lee, D.O., Roman, P., Wu, C.-T., Wang, J., Shallenberger, J., Mumbauer, P., Grant, R., Ridley, R., Dolny, G., Ruzyllo, J.

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Studies of mist deposited high-k dielectrics for MOS gates von LEE, D.-O, ROMAN, P, WU, C.-T, MAHONEY, W, HORN, M, MUMBAUER, P, BRUBAKER, M, GRANT, R, RUZYLLO, J

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Mist deposited high- k dielectrics for next generation MOS gates von Lee, D.-O, Roman, P, Wu, C.-T, Mumbauer, P, Brubaker, M, Grant, R, Ruzyllo, J

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Organic Chemistry at Polymer Surfaces to Promote Adhesion to Gold and Copper: Surface-Modified Polybutadiene Having Functional Groups Containing Sulfur von Mumbauer, Paul D, Carey, Deborah H, Ferguson, Gregory S

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Studies of high-k dielectrics deposited by liquid source misted chemical deposition in MOS gate structures von Ruzyllo, J., Lee, D.-O., Roman, P., Horn, M., Mumbauer, P., Brubaker, M., Grant, R.

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Current Advances in Anhydrous HF/Organic Solvent Processing of Semiconductor Surfaces von Roman, P., Ruzyllo, Jerzy, Shanmugasundaram, K., Torek, K., Mumbauer, P., Vestyk, D., Hammond, P.

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Direct evidence of a bipolaron charge carrier in conducting polyazines from 13C and 15N solid-state NMR spectroscopy : detection of a nitrenium cation by natural abundance 15N soli... von CHALONER-GILL, B, EULER, W. B, MUMBAUER, P. D, ROBERTS, J. E

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Characteristics of Hf(Si,O) gate dielectrics as a function of Hf content von CHANG, K, SHALLENBERGER, J, CHANG, F.-M, SHANMUGASUNDARAM, K, ROMAN, P, MUMBAUER, P, RUZYLLO, J

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Effect of thermal annealing on MIST-deposited HFSIO4/SIOX/SI structures von CHANG, K, LEE, D.-O, SHANMUGASUNDARAM, K, ROMAN, P, SHALLENBERGER, J, WANG, J, MUMBAUER, P, GRANT, R, RUZYLLO, J

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Study of the effect of silicon surface treatment on equivalent oxide thickness in high-K dielectric mos gate stacks von CHANG, K, SHANMUGASUNDARAM, K, RUZYLLO, J, LEE, D.-O, ROMAN, P, SHALLENBERGER, J, CHANG, F.-M, WANG, J, MUMBAUER, P, GRANT, R, BECK, R

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