Increasing the Stability of Isolated and Dense High-Aspect-Ratio Nanopillars Fabricated Using UV-Nanoimprint Lithography von Haslinger, Michael J, Maier, Oliver S, Pribyl, Markus, Taus, Philipp, Kopp, Sonja, Wanzenboeck, Heinz D, Hingerl, Kurt, Muehlberger, Michael M, Guillén, Elena

Volltext

Single and multilayer metamaterials fabricated by nanoimprint lithography von Bergmair, I, Dastmalchi, B, Bergmair, M, Saeed, A, Hilber, W, Hesser, G, Helgert, C, Pshenay-Severin, E, Pertsch, T, Kley, E B, Hübner, U, Shen, N H, Penciu, R, Kafesaki, M, Soukoulis, C M, Hingerl, K, Muehlberger, M, Schoeftner, R

Volltext

Ischemic Stroke Secondary to Myocarditis in the Setting of COVID-19 von Musunuri, Tarakarama, Muehlberger, Patrick M

Volltext

Single and multilayer metamaterials fabricated by nanoimprint lithography von Bergmair, I, Dastmalchi, B, Bergmair, M, Saeed, A, Hilber, W, Hesser, G, Helgert, C, Pshenay-Severin, E, Pertsch, T, Kley, E B, Hübner, U, Shen, N H, Penciu, R, Kafesaki, M, Soukoulis, C M, Hingerl, K, Muehlberger, M, Schoeftner, R

Volltext

UV-NIL with working stamps made from Ormostamp von Mühlberger, M., Bergmair, I., Klukowska, A., Kolander, A., Leichtfried, H., Platzgummer, E., Loeschner, H., Ebm, Ch, Grützner, G., Schöftner, R.

Volltext

Anisotropic remastering for reducing feature sizes on UV nanoimprint lithography replica molds von Lausecker, E, Grydlik, M, Brehm, M, Bergmair, I, Mühlberger, M, Fromherz, T, Bauer, G

Volltext

Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp von MUEHIBERGER, M, BOEHM, M, PLATZGUMMER, E, LOESCHNER, H, JOECHL, P, EDER-KAPI, S, NARZT, T, LAUSECKER, E, FROMHERZ, T, BERGMAIR, I, CHOUIKI, M, SCHOEFTNER, R, KREINDL, G, KAST, M, TREIBLMAYR, D, GLINSNER, T, MILLER, R

Volltext

Nanoimprint lithography using IR laser irradiation von Grigaliūnas, V., Tamulevičius, S., Muehlberger, M., Jucius, D., Guobienė, A., Kopustinskas, V., Gudonytė, A.

Volltext

Development of a soft UV-NIL step&repeat and lift-off process chain for high speed metal nanomesh fabrication von Haslinger, M J, Mitteramskogler, T, Kopp, S, Leichtfried, H, Messerschmidt, M, Thesen, M W, Mühlberger, M

Volltext

Micro and nano materials and processing techniques for printed biodegradable electronics von Li, J., Liu, J., Huo, W., Yu, J., Liu, X., Haslinger, M.J., Muehlberger, M., Kulha, P., Huang, X.

Volltext

Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration von Kirchner, R., Guzenko, V.A., Rohn, M., Sonntag, E., Mühlberger, M., Bergmair, I., Schift, H.

Volltext

Stamp degradation for high volume UV enhanced substrate conformal imprint lithography (UV-SCIL) von Haslinger, M.J., Verschuuren, M.A., van Brakel, R., Danzberger, J., Bergmair, I., Mühlberger, M.

Volltext

UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behavior of ceramic surfaces von Mühlberger, M., Rohn, M., Danzberger, J., Sonntag, E., Rank, A., Schumm, L., Kirchner, R., Forsich, C., Gorb, S., Einwögerer, B., Trappl, E., Heim, D., Schift, H., Bergmair, I.

Volltext

UV nanoimprint lithography for the realization of large-area ordered SiGe/Si(001) island arrays von Lausecker, E., Brehm, M., Grydlik, M., Hackl, F., Bergmair, I., Mühlberger, M., Fromherz, T., Schäffler, F., Bauer, G.

Volltext

Nano- and microstructuring of graphene using UV-NIL von Bergmair, Iris, Hackl, Wolfgang, Losurdo, Maria, Helgert, Christian, Isic, Goran, Rohn, Michael, Jakovljevic, Milka M, Mueller, Thomas, Giangregorio, Maria, Kley, Ernst-Bernhard, Fromherz, Thomas, Gajic, Rados, Pertsch, Thomas, Bruno, Giovanni, Muehlberger, Michael

Volltext

In-plane field magnetoresistivity of Si two-dimensional electron gas in Si/SiGe quantum wells at 20 mK von Lu, T. M., Sun, L., Tsui, D. C., Lyon, S., Pan, W., Mühlberger, M., Schäffler, F., Liu, J., Xie, Y. H.

Volltext

Linear temperature dependence of the conductivity in Si two-dimensional electrons near the apparent metal-to-insulator transition von Lai, K., Pan, W., Tsui, D. C., Lyon, S., Mühlberger, M., Schäffler, F.

Volltext

A Moiré method for high accuracy alignment in nanoimprint lithography von Mühlberger, M., Bergmair, I., Schwinger, W., Gmainer, M., Schöftner, R., Glinsner, T., Hasenfuß, Ch, Hingerl, K., Vogler, M., Schmidt, H., Kley, E.B.

Volltext

Multilayer Nanoimprinting to Create Hierarchical Stamp Masters for Nanoimprinting of Optical Micro- and Nanostructures von Moharana, Amiya R., Ausserhuber, Helene M., Mitteramskogler, Tina, Haslinger, Michael J., Muehlberger, Michael M.

Volltext

Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5nmhp von Muehlberger, M., Boehm, M., Bergmair, I., Chouiki, M., Schoeftner, R., Kreindl, G., Kast, M., Treiblmayr, D., Glinsner, T., Miller, R., Platzgummer, E., Loeschner, H., Joechl, P., Eder-Kapl, S., Narzt, T., Lausecker, E., Fromherz, T.

Volltext