Next Generation Photosensitive Dielectric Materials for Advanced Packaging Applications von Motobe, Takeharu, Ohe, Masayuki, Yamazaki, Noriyuki, Enomoto, Tetsuya

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Improvement in Chemical Resistance of Positive-tone Photodefinable Poly(benzoxazole) Materials von Kotani, Masashi, Ohe, Masayuki, Motobe, Takeharu, Nakamura, Yuki, Taku, Konno, Minegishi, Tomonori, Ono, Keishi

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Study on Adhesion Improvement of Polyimide Film von Katoh, Kohji, Motobe, Takeharu, Ohe, Masayuki, Soejima, Kazuya, Kaneya, Yuichi, Tanaka, Toshiaki, Itabashi, Toshiaki

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New Polyimides Coating Technology for Next Generation Semiconductor Application von Katoh, Kohji, Ohe, Masayuki, Komatsu, Hiroshi, Motobe, Takeharu, Hattori, Takashi, Ueno, Takumi

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Development of Low Dk and Df polyimides for 5G application von Matsukawa, Daisaku, Nagami, Naoto, Mizuno, Kohei, Saito, Nobuyuki, Enomoto, Tetsuya, Motobe, Takeharu

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Novel Low Temperature Curable Photosensitive Negative-tone Polyimide with Higher Resolution and Reliability von Matsukawa, Daisaku, Yotsuyanagi, Hiroko, Sakakibara, Shiori, Yamazaki, Noriyuki, Enomoto, Tetsuya, Motobe, Takeharu

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PHOTOSENSITIVE POLYIMIDE PRECURSOR COMPOSITION FOR ULTRATHICK FILM von MOTOBE TAKEHARU

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METHOD FOR MEASURING AMOUNT OF RESIDUAL SOLVENT IN POLYIMIDE PRECURSOR RESIN MEMBRANE AND METHOD FOR OBTAINING BAKING CONDITION BY THE SAME von MOTOBE TAKEHARU

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DEVELOPING SOLUTION FOR PHOTOSENSITIVE POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING PATTERN von MOTOBE TAKEHARU

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WAFER CLEANING LIQUID AND METHOD OF PRODUCTION OF SEMICONDUCTOR DEVICE von MOTOBE TAKEHARU

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PHOTOSENSITIVE POLYIMIDE PRECURSOR RESIN COMPOSITION AND MANUFACTURE OF SEMICONDUCTOR DEVICE BY USING SAME von MOTOBE TAKEHARU

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POLYMERIZABLE IMIDE MONOMER, ITS PRODUCTION METHOD, AND PHOTOCURING COMPOSITION von MOTOBE TAKEHARU, KOJIMA YASUNORI

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Patterning method using developer for photosensitive polyimide precursor von KOMATSU, HIROSHI, MOTOBE, TAKEHARU

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Verwendung einer Lösung zum Entwickeln eines lichtempfindlichen Polyimidvorläufers und Methode zur Strukturierung von KOMATSU, HIROSHI, MOTOBE, TAKEHARU

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Developer for photosensitive polyimide precursor von KOMATSU, HIROSHI, MOTOBE, TAKEHARU

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Use of a solution for developing a photosensitive polyimide precursor, and method of patterning von KOMATSU, HIROSHI, MOTOBE, TAKEHARU

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DEVELOPER FOR PHOTOSENSITIVE POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING PATTERN USING THE SAME von MOTOBE TAKEHARU, KOMATSU HIROSHI

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POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM USING THE SAME AND ELECTRONIC COMPONENT von MOTOBE TAKEHARU, NAKAMURA YUKI, OE TADAYUKI

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Developer for photosensitive polyimide precursor, and method of using it for patterning von KOMATSU, HIROSHI, MOTOBE, TAKEHARU

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Developer for photosensitive polyimide precursor, and method of using it for patterning von KOMATSU, HIROSHI, MOTOBE, TAKEHARU

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