Retrospective on the risk matrix, part II: Mathematics von Moseman, James A.

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Retrospective on the risk matrix, part 1 von Moseman, James A.

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Process safety: A wicked problem? von Moseman, James

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Are These the Right Gloves?: Solubility & Maximum Protection von Moseman, James

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New risk acceptance criteria for process safety von Moseman, James

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Author's response to the editors of process safety progress von Moseman, James

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Toluene diffusion in butyl rubber von Schneider, Nathaniel S., Moseman, James A., Sung, Nak-Ho

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Central and South American pit vipers von Davidson, Terence M., Schafer, Susan F., Moseman, James

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Application of thin crystalline Si3N4 liners in shallow trench isolation (STI) structures von HO, HERBERT, FUGARDI, STEPHEN, HAMMERL, ERWIN, AJMERA, ATUL, MOSEMAN, JAMES E, DOBUZINSKY, DAVID M, PALM, J. HERBERT, RAMAC, SAMUEL C

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Shallow trench isolation with oxide-nitride/oxynitride liner von BENEDICT, JOHN PRESTON, YOSHIDA, SEIKO, DOBUZINSKY, DAVID MARK, HAMMERL, ERWIN N, PALM, HERBERT, FLAITZ, PHILIP LEE, TAKATO, HIROSHI, HO, HERBERT, MOSEMAN, JAMES F

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METHOD FOR FORMING THIN FILM OF CRYSTALLINE MATERIAL SILICON NITRIDE COVERING IN SHALLOW TRENCH ISOLATION STRUCTURE AND SHALLOW TRENCH ISOLATION STRUCTURE FOR INTEGRATED CIRCUIT DE... von DOBUZINSKY DAVID M, AJMERA ATUL, HAMMERL ERWIN, RAMAC SAMUEL C, HO HERBERT, FUGARDI STEPHEN, MOSEMAN JAMES F, PALM J HERBERT

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METHOD FOR FORMING SEPARATION REGION ON SILICON SUBSTRATE AND STRUCTURE OF SEPARATION REGION von FLAITZ PHILIP LEE, BENEDICT JOHN PRESTON, PALM HERBERT, DOBUZINSKY DAVID MARK, HO HERBERT, HAMMERL ERWIN N, TAKATO HIROSHI, MOSEMAN JAMES F, YOSHIDA SEIKO

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Shallow trench isolation with oxide-nitride/oxynitride liner von BENEDICT, JOHN PRESTON, YOSHIDA, SEIKO, DOBUZINSKY, DAVID MARK, HAMMERL, ERWIN N, PALM, HERBERT, FLAITZ, PHILIP LEE, TAKATO, HIROSHI, HO, HERBERT, MOSEMAN, JAMES F

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Application of thin crystalline Si3N4 liners in shallow trench isolation (STI) structures von DOBUZINSKY, DAVID M, HAMMERL, ERWIN, PALM, HERBERT, AJMERA, ATUL, HO, HERBERT, MOSEMAN, JAMES F, RAMAC, SAMUEL C, FUGARDI, STEPHEN

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Application of thin crystalline Si3N4 liners in shallow trench isolation (STI) structures von PALM, J. HERBERT, DOBUZINSKY, DAVID M, HAMMERL, ERWIN, AJMERA, ATUL, HO, HERBERT, MOSEMAN, JAMES F, RAMAC, SAMUEL C, FUGARDI, STEPHEN

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Application of thin crystalline Si3N4 liners in shallow trench isolation (STI) structures von HO, HERBERT, FUGARDI, STEPHEN, HAMMERL, ERWIN, AJMERA, ATUL, MOSEMAN, JAMES E, DOBUZINSKY, DAVID M, PALM, J. HERBERT, RAMAC, SAMUEL C

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Anwendung von dünnen kristallinen Si3N4-Strukturen in Flachgräbenisolationsstrukturen von HO, HERBERT, FUGARDI, STEPHEN, HAMMERL, ERWIN, AJMERA, ATUL, MOSEMAN, JAMES E, DOBUZINSKY, DAVID M, PALM, J. HERBERT, RAMAC, SAMUEL C

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Enolase inhibitors as therapeutic leads for Naegleria fowleri infection von Milanes, Jillian E, Yan, Victoria C, Pham, Cong-Dat, Muller, Florian, Kwain, Samuel, Rees, Kerrick C, Dominy, Brian N, Whitehead, Daniel C, Millward, Steven W, Bolejack, Madison, Shek, Roger, Tillery, Logan, Phan, Isabelle Q, Staker, Bart, Moseman, E Ashley, Zhang, Xiang, Ma, Xipeng, Jebet, Audriy, Yin, Xinmin, Morris, James C

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PDGFRs are critical for PI3K/Akt activation and negatively regulated by mTOR von Zhang, Hongbing, Bajraszewski, Natalia, Wu, Erxi, Wang, Hongwei, Moseman, Annie P, Dabora, Sandra L, Griffin, James D, Kwiatkowski, David J

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Comparison of N2O Emissions and Gene Abundances between Wastewater Nitrogen Removal Systems von Brannon, Elizabeth Quinn, Moseman‐Valtierra, Serena M., Lancellotti, Brittany V., Wigginton, Sara K., Amador, Jose A., McCaughey, James C., Loomis, George W.

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