Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor von Tokashiki, Ken, Bai, KeunHee, Baek, KyeHyun, Kim, Yongjin, Min, Gyungjin, Kang, Changjin, Cho, Hanku, Moon, Jootae

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Real-time monitoring of plasma flickering in high pressure electronegative discharge von Yongjin Kim, Kyehyun Baek, Samhae Lee, Sungno Lee, Jaewook Lee, Yeonhong Jee, Changjin Kang, Hanku Cho, Jootae Moon

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Issues of contact etching and pre-treatment in Schottky contact von Lee, Haksun, Shin, Kyoungsub, Cho, Nammyun, Min, Gyungjin, Kang, Changjin, Han, Woosung, Moon, Jootae

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Real-time process monitoring by optical emission spectroscopy in DRAM gate CD control von Yongjin Kim, Gyungjin Min, Changjin Kang, Hanku Cho, Jootae Moon

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Optimization of Sample Plan for Overlay and Alignment Accuracy Improvement von Hong, Jinseog, Lee, Junghyeon, Park, Joonsoo, Cho, Hanku, Moon, Jootae

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Pattern Displacement Error under Off Axis Illumination von Seong, Nakgeuon, Kang, Hoyoung, Kye, Jongwook, Cho, Hanku, Moon, Jootae

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Impact of stray light depending on image quality: An approximation using total integrated scatter von Kim, Young-Chang, De Bisschop, Peter, Vandenberghe, Geert, Van Den Hove, Luc, Cho, Hanku, Moon, Jootae

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Dielectric Properties of (ZrxTi1-x)O2 Film on Ru/SiO2/Si Substrates Deposited by the Atomic Layer Deposition Using [Zr(OtBu)4 + Ti(OtBu)4] Cocktail Source von Lim, Jaesoon, Cho, Kyuho, Kim, Kichul, Yoo, Chayoung, Kim, Sung-Tae, Chung, Uin, Moon, Jootae

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Low Si Recess on Cleaning Process by Dilute HF/SC-1 with Megasonic von Moon, Joo Tae, Hong, Chang Ki, Mun, Chang Sup, Cho, Han Ku, Lee, Kuntack, Cha, Ji Hoon, Kang, Dae Hyuk, Shim, Woo Gwan

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Effect of Ashing, Strip and Annealing Process on the Dopant Concentration of Silicon von Lee, Mong Sup, Park, ImSoo, Kang, DaeHyuk, Han, DongGyun, Son, YoonHo, Lee, KunTack, Hong, ChangKi, Kang, ChangJin, Moon, JooTae

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Development of a New TaN Etchant for Metal Gate von Park, Im Soo, Moon, Joo Tae, Hong, Chang Ki, Kim, Sang Yong, Cho, Han Ku, Lee, Kuntack, Cha, Ji Hoon, Lee, Mong Sup, Han, Jeong Nam

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Low-k SiBN (Silicon Boron Nitride) Film Synthesized by a Plasma-Assisted Atomic Layer Deposition von Yang, Sang Ryol, Kim, Jin-Gyun, Noh, Jin-Tae, Kim, Hong-Suk, Lee, Sung-Hae, Ahn, Jae-Young, Hwang, Ki-Hyun, Shin, Yu-Gyun, Chung, Uin, Moon, Jootae, Lee, Dong-Kak, Yi, In-Sun, Jung, Ran-Ju, Kang, Sang-Bum

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Pattern Displacement Error Under Off-Axis Illumination von Nakgeuon Seong, Jongwook Kye, Hoyoung Kang, Jootae Moon

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Optimization of sampling method for overlay and alignment accuracy improvement von Jinseog Hong, Junghyeon Lee, Joonsoo Park, Hanku Cho, Jootae Moon

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Effects of fluorocarbon polymer deposition on the selective etching of SiO2/photoresist in high density plasma von Chu, Changwoong, Ahn, Taehyuk, Kim, Jisoo, Jeong, Sangsup, Moon, Jootae

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Feasibility of new ARC using PECVD for both KrF and ArF lithography von Yongbeom Kim, Junghyeon Lee, Hanku Cho, Jootae Moon

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A Study On The High Temperture Platinum Etching von Hyounwoo Kim, Byongsun Ju, Beongyoon Nam, Wonjong Yoo, Changjln Kang, Jootae Moon, Moonyong Lee

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Impact of stray light depending on image quality: An approximationusing total integrated scatter von Kim, Young-Chang, De Bisschop, Peter, Vandenberghe, Geert, Van Den Hove, Luc, Cho, Hanku, Moon, Jootae

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Effect of Ashing, Strip and Annealing Process on the Dopant Concentration of Silicon von Lee, Mong Sup, Park, ImSoo, Kang, DaeHyuk, Han, DongGyun, Son, YoonHo, Lee, KunTack, Hong, ChangKi, Kang, ChangJin, Moon, JooTae

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Development of High Selective Poly-Si Strip Process by USing Remote Plasma von Han, Jeongnam, Shim, W., Choi, Sangjun, Hong, Chang-Ki, Cho, Hanku, Moon, Jootae

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