Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography von Rosenfield, M.G., Wind, S.J., Molzen, W.W., Gerber, P.D.

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A fully scaled submicrometer NMOS technology using direct-write E-beam lithography von Wordeman, M.R., Schweighart, A.M., Dennard, R.H., Sai-Halasz, G., Molzen, W.W.

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Gradient-based optimization of custom circuits using a static-timing formulation von Conn, A.R., Elfadel, I.M., Molzen, W.W., O'Brien, P.R., Strenski, P.N., Visweswariah, C., Whan, C.B.

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Flux quantization in periodic networks containing tiles with irrational ratio of areas von SANTHANAM, P, CHI, C. C, MOLZEN, W. W

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NiFe films deposited by sputter gun and applications to bubble devices von Tao, L.J., Ahn, K.Y., Lin, B.J., Molzen, W.W.

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