Plasma charge current for controlling and monitoring electron beam welding with beam oscillation von Trushnikov, Dmitriy, Belenkiy, Vladimir, Shchavlev, Valeriy, Piskunov, Anatoliy, Abdullin, Aleksandr, Mladenov, Georgy

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Controlling the Electron Beam Focus Regime and Monitoring the Keyhole in Electron Beam Welding von Trushnikov, Dmitriy N., Mladenov, Georgy M., Belenkiy, Vladimir Ya

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Computer simulation of resist profiles at electron beam nanolithography von Vutova, Katia, Koleva, Elena, Mladenov, Georgy, Kostic, Ivan, Tanaka, Takeshi

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EBT-2003 von Mladenov, Georgy

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A simulation model for chemically amplified resist CAMP6 von Vutova, Katia, Koleva, Elena, Mladenov, Georgy, Kostic, Ivan, Tanaka, Takeshi, Kawabata, Keishi

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Nonlinear Solubility Behavior of Polymer and Oligomer Resists at Electron Beam Modification von Katia Vutova, Georgy Mladenov, Elena Koleva, Ivan Kostic, Anna Bencurova, Pavol Nemec, Takeshi Tanaka

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Nonlinear Solubility Behavior of Polymer and Oligomer Resists at Electron Beam Modification von Vutova, K, Mladenov, G, Koleva, E, Kostic, I, Bencurova, A, Nemec, P, Tanaka, T

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Some effects at ion beam modification of polymethyl methacrylate von Mladenov, Georgy M, Emmoth, Birger, Braun, Manuel

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Computer Simulation of Processes At Electron and Ion Beam Lithography, Part 2 : Simulation of Resist Developed Images At Electron and Ion Beam Lithography von Vutova, Katia

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General problems of high resolution lithography von Mladenov, Georgy M., Seyfarth, Harald

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