Asymmetric Supply Type Hydrostatic Journal Gas Bearings to Support Large Load Rotors von ISE, Tomohiko, MIYATAKE, Hiroshi, ASAMI, Toshihiko

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Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High-$k$/Metal Gate Transistor von Murata, Tatsunori, Miyagawa, Yoshihiro, Nishida, Yukio, Yamamoto, Yoshiki, Yamashita, Tomohiro, Matsuura, Masazumi, Asai, Koyu, Miyatake, Hiroshi

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Performance of Cu Dual-Damascene Interconnects Using a Thin Ti-Based Self-Formed Barrier Layer for 28 nm Node and Beyond von Ohmori, Kazuyuki, Mori, Kenichi, Maekawa, Kazuyoshi, Kohama, Kazuyuki, Ito, Kazuhiro, Ohnishi, Takashi, Mizuno, Masao, Asai, Koyu, Murakami, Masanori, Miyatake, Hiroshi

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Influence of poly-Si potential on profile distortion caused by charge accumulation von OGINO, S, FUJIWARA, N, MIYATAKE, H, YONEDA, M

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TRANSFORMATION OF DENSE CONTACT HOLES DURING SiO2 ETCHING von Sakamori, S, Fujiwara, N, Miyatake, H, Oikawa, K, Yamanaka, M, Sasaki, T

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Mechanism of AlCu film corrosion von SIOZAWA, K.-I, FUJIWARA, N, MIYATAKE, H, YONEDA, M

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Evaluation of electron shading charge buildup damage using metal-nitride-oxide-silicon capacitors von SAKAMORI, S, MARUYAMA, T, FUJIWARA, N, MIYATAKE, H, YONEDA, M

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Effect of N2 Gas Flow Ratio in Plasma-Enhanced Chemical Vapor Deposition with SiH4--NH3--N2--He Gas Mixture on Stress Relaxation of Silicon Nitride von Murata, Tatsunori, Miyagawa, Yoshihiro, Matsuura, Masazumi, Asai, Koyu, Miyatake, Hiroshi

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Influence of electron shading on highly selective SiO2 to Si etching von Yonekura, Kazumasa, Katayama, Toshiharu, Maruyama, Takahiro, Fujiwara, Nobuo, Miyatake, Hiroshi

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Influence of Pulsed Electron Cyclotron Resonance Plasma on Gate Electrode Etching von Fujiwara, Nobuo, Maruyama, Takahiro, Miyatake, Hiroshi

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Effect of N 2 Gas Flow Ratio in Plasma-Enhanced Chemical Vapor Deposition with SiH 4 –NH 3 –N 2 –He Gas Mixture on Stress Relaxation of Silicon Nitride von Murata, Tatsunori, Miyagawa, Yoshihiro, Matsuura, Masazumi, Asai, Koyu, Miyatake, Hiroshi

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Profile distortion caused by local electric field in polysilicon etching von OGINO, S, FUJIWARA, N, MIYATAKE, H, YONEDA, M, HARADA, H

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Effect of Electron Shading on Gate Oxide Degradation von Sakamori, Shigenori, Maruyama, Takahiro, Fujiwara, Nobuo, Miyatake, Hiroshi

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Effects of Charge Build-up of Underlying Layer by High Aspect Ratio Etching von Yonekura, Kazumasa, Kiritani, Masahide, Sakamori, Shigenori, Yokoi, Takahiro, Fujiwara, Nobuo, Miyatake, Hiroshi

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Cu Dual-Damascene Interconnects with Direct Chemical Mechanical Polishing Process on Porous Low-$k$ Film von Izumitani, Junko, Kodama, Daisuke, Kido, Shigenori, Chibahara, Hiroyuki, Oka, Yoshihiro, Goto, Kinya, Suzumura, Naohito, Fujisawa, Masahiko, Miyatake, Hiroshi

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Highly selective contact hole etching using electron cyclotron resonance plasma von KIMURA, H, SHIOZAWA, K, KAWAI, K, MIYATAKE, H, YONEDA, M

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Narrow Line Effect of Nickel Silicide on p + Active Lines and Its Suppression by Fluorine Ion Implantation von Yamaguchi, Tadashi, Kashihara, Keiichiro, Okudaira, Tomonori, Asai, Koyu, Miyatake, Hiroshi, Yoneda, Masahiro

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Electron scattering from Si surface and interface by cross-sectional transmission electron microscopy von MIYATAKE, H, YONEDA, M, MURAYAMA, K, HARADA, J

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ALUMINUM PHOSPHATE COMPOUND von MIYATAKE, Hiroshi, KANO, Shunsuke, KANZAWA, Noriyuki

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MEDIUM FOR CULTURING PNEUMOCOCCAL SAMPLES von PIAO, Zhenyu, MIYATAKE, Hiroshi, KOIZUMI, Yuka

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