Revolutionary and evolutionary resist design concepts for 193 nm lithography von Nalamasu, O., Wallow, T.I., Reichmanis, E., Novembre, A.E., Houlihan, F.M., Dabbagh, G., Mixon, D.A., Hutton, R.S., Timko, A.G., Wood, O.R., Cirelli, R.A.

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Copolymerization of t-butoxycarbonyloxystyrene and sulfur dioxide von Bohrer, Michael P., Mixon, David A.

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Identification of sensitive positive and negative working resist materials for proximity X-ray lithography von Novembre, A.E., Kometani, J.M., Knurek, C.S., Kumar, U., Neenan, T.X., Mixon, D.A., Nalamasu, O., Mu¨nzel, N.

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Ultrapurification of SiCl4 by photochlorination in a bubble column reactor von Mixon, David A., Bohrer, Michael P., O'Hara, Patricia A.

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