Extracorporeal cardiopulmonary resuscitation versus conventional cardiopulmonary resuscitation in adults with out-of-hospital cardiac arrest: A prospective observational study von Sakamoto, Tetsuya, Morimura, Naoto, Nagao, Ken, Asai, Yasufumi, Yokota, Hiroyuki, Nara, Satoshi, Hase, Mamoru, Tahara, Yoshio, Atsumi, Takahiro

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Association of Contrast Extravasation Grade With Massive Transfusion in Pediatric Blunt Liver and Spleen Injuries: A Multicenter Retrospective Cohort Study von Katsura, Morihiro, Fukuma, Shingo, Kuriyama, Akira, Kuriyama, Akira, Kondo, Yutaka, Yasuda, Hideto, Matsushima, Kazuhide, Shiraishi, Atsushi, Kusaka, Akari, Nakabayashi, Yosuke, Nakabayashi, Yosuke, Yagi, Masayuki, Ito, Fumihito, Tanikawa, Atsushi, Kushimoto, Shigeki, Ito, Tomoya, Yamamoto, Motoyoshi, Yamamoto, Yoshihiro, Takahashi, Nozomi, Osuka, Akinori, Ishikawa, Nobuki, Takayama, Kazushi, Minowa, Keita, Hakamada, Kenichi, Hayakawa, Mineji, Kawahara, Shota, Hirano, Satoshi, Matsumoto, Marika, Kusumoto, Kohei, Kodaira, Hiroshi, Kobayashi, Michio, Sakuraya, Masaaki, Shinjo, Takafumi, Ono, Shigeru, Omori, Kazuhiko, Kamimura, Yoshio, Tanaka, Rei, Sato, Yukio, Kyogoku, Noriaki, Onishi, Masafumi, Kawai, Kaichi, Hayashida, Kazuyuki, Terazumi, Keiko, Matsushime, Susumu, Takasu, Osamu, Morita, Toshio, Sato, Nagato, Ishii, Wataru, Miyaguni, Michitaro, Ohtaki, Yoshimi, Murata, Kiyoshi, Kaneko, Tadashi, Takamizawa, Shigeru, Yasui, Akihiro, Mayama, Yasuaki, Gima, Masafumi, Okada, Ichiro, Tsuchiya, Asuka, Ishigami, Koji, Yasumatsu, Hiroshi, Shigeta, Kenta, Kato, Kohei, Iida, Atsuyoshi, Yumoto, Tetsuya, Katsura, Morihiro, Saegusa, Yoshitaka, Azuma, Tomohiko, Asano, Shima, Umemura, Takehiro, Yamamoto, Takao, Ishikawa, Junichi, Uebayashi, Elena Yukie, Nakao, Shunichiro, Ogawa, Yuko, Irinoda, Takashi, Narumi, Yuki, Ogura, Takayuki, Matsumoto, Shokei, Miyamoto, Daisuke, Kubota, Narumi, Konda, Yusuke, Asai, Takeshi, Muronoi, Tomohiro, Matsushima, Kazuhide, Hifumi, Toru, Shirasaki, Kasumi, Furuta, Shigeyuki, Fujikawa, Atsuko, Takaoka, Makoto, Nara, Satoshi, Kushimoto, Shigeki, Tanikawa, Atsushi, Tsuchikane, Masato, Miura, Naoya, Sakoda, Naoki, Takada, Tadaaki, Endo, Akira, Nakatsutsumi, Keita, Hagiwara, Yusuke, Gotou, Tamotsu

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Fatal SARS-CoV-2 Infection among Children, Japan, January-September 2022 1 von Mitsushima, Shingo, Yahata, Yuichiro, Tsuchihashi, Yuuki, Ikenoue, Chiaki, Fukusumi, Munehisa, Otake, Shogo, Shimada, Tomoe, Yamagishi, Takuya, Kamiya, Hajime, Kobayashi, Yusuke, Kurosu, Hitomi, Okuyama, Mai, Morino, Saeko, Shibamura, Miho, Takanashi, Sayaka, Kamigaki, Taro, Otani, Kanako, Nakashita, Manami, Ito, Hanae, Miyazaki, Ayako, Koshiko, Masaya, Harakuni, Masanao, Onuma, Megumi, Chiba, Hiroko, Masutani, Maki, Sudani, Natsu, Satsuki, Yuka, Takara, Taketoshi, Oka, Akira, Katsuta, Tomohiro, Shimizu, Naoki, Saitoh, Akihiko, Sakamoto, Tetsuya, Suzuki, Motoi, Sunagawa, Tomimasa

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Evaluation and control of defects, formed by keV-MeV implantation von Saito, S., Hamada, K., Mineji, A.

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Low energy BF2 implantation for the suppression of B penetration von Mineji, A., Hamada, K., Hayashi, T., Saito, S.

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Ultra Shallow Junction and Super Steep Halo Formation Using Carbon Co-implantation for 65nm High Performance CMOS Devices von Mineji, A., Shishiguchi, S.

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Optimized Source/Drain Ion Implantation Conditions for P-Channel Metal–Oxide–Semiconductor Field-Effect-Transistor Formation von Shishiguchi, Seiichi, Mineji, Akira, Matsuda, Tomoko

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Integration of manufacturable 65nm-node HfSiON transistors optimized with low-thermal-budget CMOS process von Mineji, A., Tamura, Y., Watanabe, T., Ozaki, H., Ootsuka, F., Aoyama, T., Shibata, K., Tsujita, K., Ohashi, N., Yasuhira, M., Arikado, T.

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Low energy BF 2 implantation for the suppression of B penetration von Mineji, A., Hamada, K., Hayashi, T., Saito, S.

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Lateral Diffusion Distance Measurement of 40–80 nm Junctions by Etching/TEM-Electron Energy Loss Spectroscopy Method von Kunimune, Yorinobu, Nishio, Naoharu, Kikuchi, NoriyukiKodama, Toda, Takeshi, Mineji, Akira, Shishiguchi, Seiichi, Saito, Shuichi

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Pushing Planar Bulk CMOSFET Scaling to its Limit by Ultimately Shallow Diffusion-Less Junction von Uejima, K., Yako, K., Ikarashi, N., Narihiro, M., Tanaka, M., Nagumo, T., Mineji, A., Shishiguchi, S., Hane, M.

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Aggressive design of millisecond annealing junctions for near-scaling-limit bulk CMOS using raised source/drain extensions von Yako, K., Uejima, K., Yamamoto, T., Mineji, A., Nagumo, T., Ikezawa, T., Matsuzaka, N., Shishiguchi, S., Hase, T., Hane, M.

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Ultra-low thermal budget CMOS process for 65nm-node low-operation-power applications von OOTSUKA, F, MINEJI, A, YAMASHITA, K, YASUHIRA, M, ARIKADO, T

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Novel diffusion-less ultra-shallow junction engineering based on millisecond annealing for sub-30 nm gate length planar bulk CMOSFET von Uejima, K., Yako, K., Ikarashi, N., Narihiro, M., Tanaka, M., Nagumo, T., Mineji, A., Shishiguchi, S., Hane, M.

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Experimental and theoretical results of dopant activation by a combination of spike and flash annealing von Lerch, W., Paul, S., Niess, J., Chan, J., McCoy, S., Gelpey, J., Cristiano, F., Severac, F., Fazzini, P.F., Bolze, D., Pichler, P., Martinez, A., Mineji, A., Shishiguchi, S.

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Sub-30nm Mosfet Fabrication Technology Incorporating Precise Dopant Profile Design using Diffusion-Less High-Activation Laser Annealing von Narihiro, M., Iwamoto, T., Yamamoto, T., Ikezawa, T., Yako, K., Tanaka, M., Mineji, A., Okuda, Y., Uejima, K., Shishiguchi, S., Hane, M.

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High-Performance 45nm node CMOS Transistors Featuring Flash Lamp Annealing (FLA) von Sanuki, T., Togo, M., Ohno, K., Yoshimura, H., Yoshida, K., Ito, T., Mineji, A., Yoshino, K., Itani, T., Matsuo, K., Sato, T., Iwamoto, T., Mori, S., Nakazawa, K., Nakazawa, M., Shinyama, T., Suguro, K., Mizushima, I., Iwasa, S., Muramatsu, S., Nagaoka, K., Ikeda, M., Ota, K., Saito, M., Naruse, H., Enomoto, Y., Kitano, T., Iwai, M., Imai, K., Nagashima, N., Kuwata, T., Matsuoka, F., Komoda, T., Yamazaki, H., Eiho, A., Miyagi, K., Nakayama, K., Fuji, O.

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45nm Node p+ USJ Formation With High Dopant Activation And Low Damage von Borland, J., Shishiguchi, S., Mineji, A., Krull, W., Jacobson, D., Tanjyo, M., Lerch, W., Paul, S., Gelpey, J., McCoy, S., Venturini, J., Current, M., Faifer, V., Hillard, R., Benjamin, M., Walker, T., Buczkowski, A., Zhiqiang Li, Chen, J.

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Reduction of point defects in PMOS source/drain formation von Mineji, A., Shishiguchi, S., Matsuda, T., Saito, S.

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33 nm ultra-shallow junction technology by oxygen-free and point-defect reduction process von Shishiguchi, S., Mineji, A., Yasunaga, T., Saito, S.

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