Safety of laboratory analyzers for infection testing - results of the market surveillance by the BfArM until End 2007 von Siekmeier, R, Halbauer, J, Mientus, W, Wetzel, D

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Intercomparison of far-infrared transmittance measurements von Kehrt, M, Monte, C, Steiger, A, Hoehl, A, Hollandt, J, Gemünd, H-P, Brömel, A, Hänschke, F, May, T, Deßmann, N, Hübers, H-W, Mientus, R, Reck, E

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A two-host fosmid system for functional screening of (meta)genomic libraries from extreme thermophiles von Angelov, Angel, Mientus, Markus, Liebl, Susanne, Liebl, Wolfgang

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Reduced Event-Related Current Density in the Anterior Cingulate Cortex in Schizophrenia von Mulert, Christoph, Gallinat, Jürgen, Pascual-Marqui, Roberto, Dorn, Hans, Frick, Konrad, Schlattmann, Peter, Mientus, Susanne, Herrmann, Werner M., Winterer, Georg

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P300 and LORETA: comparison of normal subjects and schizophrenic patients von Winterer, G, Mulert, C, Mientus, S, Gallinat, J, Schlattmann, P, Dorn, H, Herrmann, W M

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Cortical hypoactivation during resting EEG in schizophrenics but not in depressives and schizotypal subjects as revealed by low resolution electromagnetic tomography (LORETA) von Mientus, Susanne, Gallinat, Jürgen, Wuebben, Yvonne, Pascual-Marqui, Roberto D, Mulert, Christoph, Frick, Kurt, Dorn, Hans, Herrmann, Werner M, Winterer, Georg

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Reactive magnetron sputtering of molybdenum sulfide thin films: In situ synchrotron x-ray diffraction and transmission electron microscopy study von Weiss, V., Bohne, W., Röhrich, J., Strub, E., Bloeck, U., Sieber, I., Ellmer, K., Mientus, R., Porsch, F.

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Electrical and optical properties of highly (001) textured WSX films deposited by reactive magnetron sputtering von Seeger, S., Mientus, R., Röhrich, J., Strub, E., Bohne, W., Ellmer, K.

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Reactive magnetron sputtering of highly (001)-textured WS2−x films: Influence of Ne+, Ar+ and Xe+ ion bombardment on the film growth von Ellmer, K., Seeger, S., Sieber, I., Bohne, W., Röhrich, J., Strub, E., Mientus, R.

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Reactive magnetron sputtering of highly (001)-textured WS2−x films: Influence of Ne+, Ar+ and Xe+ ion bombardment on the film growth von Ellmer, K., Seeger, S., Sieber, I., Bohne, W., Röhrich, J., Strub, E., Mientus, R.

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Reactive magnetron sputtering of highly (001)‐textured WS 2− x films: Influence of Ne + , Ar + and Xe + ion bombardment on the film growth von Ellmer, K., Seeger, S., Sieber, I., Bohne, W., Röhrich, J., Strub, E., Mientus, R.

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Reactive magnetron sputtering of highly (001)‐textured WS 2− x films: Influence of Ne + , Ar + and Xe + ion bombardment on the film growth von Ellmer, K., Seeger, S., Sieber, I., Bohne, W., Röhrich, J., Strub, E., Mientus, R.

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Reactive magnetron sputtering of highly (001)-textured WS2-xfilms : Influence of Ne+, Ar+ and Xe+ ion bombardment on the film growth von ELLMER, K, SEEGER, S, SIEBER, I, BOHNE, W, RÖHRICH, J, STRUB, E, MIENTUS, R

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PRESSURE CONTROL SYSTEMS von JAMES A. MIENTUS, JOHN W. HENNEMAN

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Pressure control systems von HENNEMAN JOHN W, MIENTUS JAMES A

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