Resonant Photoemission at the O1s threshold to characterize β-Ga2O3 single crystals von Michling, Marcel

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Substrate Reactivity Effects in the Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum on Ruthenium von Tallarida, Massimo, Kukli, Kaupo, Michling, Marcel, Ritala, Mikko, Leskelä, Markku, Schmeisser, Dieter

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In situ study of the atomic layer deposition of HfO2 on Si von Kolanek, Krzysztof, Tallarida, Massimo, Michling, Marcel, Schmeisser, Dieter

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In situ study of the atomic layer deposition of HfO 2 on Si von Kolanek, Krzysztof, Tallarida, Massimo, Michling, Marcel, Schmeisser, Dieter

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Resonant Photoemission at the O1s threshold to characterize beta -Ga sub(2)O sub(3) single crystals von Michling, Marcel, Schmeisser, Dieter

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Resonant Photoemission at the O1s threshold to characterize β-Ga 2 O 3 single crystals von Michling, Marcel, Schmeißer, Dieter

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Atomic layer deposition reactor for fabrication of metal oxides von Kolanek, Krzysztof, Tallarida, Massimo, Michling, Marcel, Karavaev, Konstantin, Schmeisser, Dieter

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Experimental electronic structure of In 2 O 3 and Ga 2 O 3 von Janowitz, Christoph, Scherer, Valentina, Mohamed, Mansour, Krapf, Alica, Dwelk, Helmut, Manzke, Recardo, Galazka, Zbigniew, Uecker, Reinhard, Irmscher, Klaus, Fornari, Roberto, Michling, Marcel, Schmeißer, Dieter, Weber, Justin R, Varley, Joel B, Walle, Chris G Van de

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Substrate Reactivity effects in the ALD of Al 2 O 3 Revealed by In Situ ALD von Tallarida, Massimo, Michling, Marcel, Das, Chittaranjan, Schmeisser, Dieter

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Spektroskopische Untersuchungen an organischen Materialien und Metalloxiden von Michling, Marcel Frank

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