Leaching and drying marks on photoresist-coated substrates von Belmiloud, N., Tamaddon, A.H., Mertens, P.W., Struyf, H.

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Germanium MOSFET Devices: Advances in Materials Understanding, Process Development, and Electrical Performance von Brunco, D. P., De Jaeger, B., Eneman, G., Mitard, J., Hellings, G., Satta, A., Terzieva, V., Souriau, L., Leys, F. E., Pourtois, G., Houssa, M., Winderickx, G., Vrancken, E., Sioncke, S., Opsomer, K., Nicholas, G., Caymax, M., Stesmans, A., Van Steenbergen, J., Mertens, P. W., Meuris, M., Heyns, M. M.

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ToF–SIMS and XPS study of ion implanted 248 nm deep ultraviolet (DUV) photoresist von Franquet, A., Tsvetanova, D., Conard, T., Vos, R., Vereecke, G., Mertens, P.W., Heyns, M.M., Vandervorst, W.

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Non-destructive characterization of saw damage in silicon photovoltaics substrates by means of photomodulated optical reflectance von Bogdanowicz, J., Mertens, P. W., Cornagliotti, E., Wostyn, K., Penaud, J., Jaffrennou, P., Abric, E., Vandervorst, W.

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Fundamental study of the removal mechanisms of nano-sized particles using brush scrubber cleaning von Xu, K., Vos, R., Vereecke, G., Doumen, G., Fyen, W., Mertens, P. W., Heyns, M. M., Vinckier, C., Fransaer, J., Kovacs, F.

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Model for the current–voltage characteristics of ultrathin gate oxides after soft breakdown von Houssa, M., Nigam, T., Mertens, P. W., Heyns, M. M.

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Particle adhesion and removal mechanisms during brush scrubber cleaning von Xu, K., Vos, R., Vereecke, G., Doumen, G., Fyen, W., Mertens, P. W., Heyns, M. M., Vinckier, C., Fransaer, J.

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Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers von Hellin, D., Rip, J., Arnauts, S., De Gendt, S., Mertens, P.W., Vinckier, C.

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Determination of tunnelling parameters in ultra-thin oxide layer poly-Si/SiO2/Si structures von DEPAS, M, VERMEIRE, B, MERTENS, P. W, VAN MEIRHAEGHE, R. L, HEYNS, M. M

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Physical forces exerted by microbubbles on a surface in a traveling wave field von Brems, S., Hauptmann, M., Camerotto, E., Mertens, P.W., Heyns, M., Struyf, H., De Gendt, S.

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Non-Gaussian behavior and anticorrelations in ultrathin gate oxides after soft breakdown von Vandewalle, N., Ausloos, M., Houssa, M., Mertens, P. W., Heyns, M. M.

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Relation between stress-induced leakage current and time-dependent dielectric breakdown in ultra-thin gate oxides von Houssa, M, Mertens, P W, Heyns, M M

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Influence of gasification on the performance of a 1 MHz nozzle system in megasonic cleaning von Hauptmann, M., Brems, S., Camerotto, E., Zijlstra, A., Doumen, G., Bearda, T., Mertens, P.W., Lauriks, W.

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Vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis on Ge wafers von Hellin, D., Geens, V., Teerlinck, I., Van Steenbergen, J., Rip, J., Laureyn, W., Raskin, G., Mertens, P.W., De Gendt, S., Vinckier, C.

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Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions von TEERLINCK, I, MERTENS, P. W, SCHMIDT, H. F, MEURIS, M, HEYNS, M. M

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Electrical properties of thin SiON/Ta2O5 gate dielectric stacks von Houssa, M., Degraeve, R., Mertens, P. W., Heyns, M. M., Jeon, J. S., Halliyal, A., Ogle, B.

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Chemical and structural modifications in a 193-nm photoresist after low- k dry etch von Kesters, E., Claes, M., Le, Q.T., Lux, M., Franquet, A., Vereecke, G., Mertens, P.W., Frank, M.M., Carleer, R., Adriaensens, P., Biebuyk, J.J., Bebelman, S.

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Quantitative Modelling of Deposition of Airborne Molecular Contamination von Mertens, Paul W.

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Impact of iron contamination and roughness generated in ammonia hydrogen peroxide mixtures (SC1) on 5 nm gate oxides von DE GENDT, S, KNOTTER, D. M, KENIS, K, MERTENS, P. W, HEYNS, M. M

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Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on si wafer surfaces von DE WITTE, H, DE GENDT, S, DOUGLAS, M, CONARD, T, KENIS, K, MERTENS, P. W, VANDERVORST, W, GIJBELS, R

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