Integration of a double-polysilicon emitter-base self-aligned bipolar transistor into a 0.5- mu m BiCMOS technology for fast 4-Mb SRAM's von Hayden, J.D., Burnett, J.D., Perera, A.K., Mele, T.C., Walczyk, F.W., Kaushik, V., Lage, C.S., See, Y.-C.

Volltext

Deposition of ultrathin silicon dioxide film from pyrolysis of tetraethoxysilane von Ong, T. P., Tobin, Philip, Mele, Thomas

Volltext

Kinetic analysis of silicon oxidations in the thin regime by incremental growth von Ajuria, Sergio A., Kenkare, Prashant U., Nghiem, Anh, Mele, Thomas C.

Volltext

Re-evaluation of the benefits of postoxidation annealing on sub-100 angstrom gate oxide quality von Ajuria, Sergio A, Maiti, Bikas, Tobin, Philip J, Mele, Thomas C

Volltext

Comparison of surface charge analysis and MOS C-V as techniques for ionic impurity detection in Si/SiO2 structures von AJURIA, S. A, FITCH, J. T, WORKMAN, D, MELE, T. C

Volltext

Use of screening and response surface experimental designs for development of a 0.5- mu m CMOS self-aligned titanium silicide process von Jones, R.E., Mele, T.C.

Volltext

A high-performance 0.5- mu m BiCMOS technology for fast 4-Mb SRAMs von Hayden, J.D., Mele, T.C., Perera, A.H., Burnett, D., Walczyk, F.W., Lage, C.S., Baker, F.K., Woo, M., Paulson, W., Lien, M., See, Y.-C., Denning, D., Cosentino, S.J.

Volltext

A cobalt salicide CMOS process with TiN-strapped polysilicon gates von Pfiester, J.R., Mele, T.C., Limb, Y., Jones, R.E., Woo, M., Boeck, B., Gunderson, C.D.

Volltext

METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION von MELE THOMAS C, SEUTTER SEAN M, MAEDA YUJI, IYER R. SURYANARAYANAN, TANDON SANJEEV, WANG YAXIN

Volltext bestellen

A high-performance half-micrometer generation CMOS technology for fast SRAMs von Hayden, J.D., Baker, F.K., Ernst, S.A., Jones, R.E., Klein, J., Lien, M., McNelly, T.F., Mele, T.C., Mendez, H., Nguyen, B.-Y., Parrillo, L.C., Paulson, W., Pfiester, J.R., Pintchovski, F., See, Y.-C., Sivan, R.D., Somero, B.M., Travis, E.O.

Volltext

Method for silicon based dielectric chemical vapor deposition von Wang, Yaxin, Maeda, Yuji, Mele, Thomas C, Seutter, Sean M, Tandon, Sanjeev, Iyer, R. Suryanarayanan

Volltext bestellen

Method for silicon based dielectric chemical vapor deposition von MELE THOMAS C, SEUTTER SEAN M, MAEDA YUJI, IYER R. SURYANARAYANAN, TANDON SANJEEV, WANG YAXIN

Volltext bestellen

METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION von MELE THOMAS C, SEUTTER SEAN M, MAEDA YUJI, IYER R. SURYANARAYANAN, TANDON SANJEEV, WANG YAXIN

Volltext bestellen

METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION von WANG, YAXIN, MAEDA, YUJI, MELE, THOMAS C, SEUTTER, SEAN M, IYER, R. SURYANARAYANAN, TANDON, SANJEEV

Volltext bestellen

METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION von WANG, YAXIN, MAEDA, YUJI, MELE, THOMAS C, SEUTTER, SEAN M, IYER, R. SURYANARAYANAN, TANDON, SANJEEV

Volltext bestellen

Method for silicon based dielectric chemical vapor deposition von MELE THOMAS C, IYER R. S, SEUTTER SEAN M, MAEDA YUJI, TANDON SANJEEV, WANG YAXIN

Volltext bestellen

Barbecue mechanism von MELE THOMAS W

Volltext bestellen

Silicon nitride film with stress control von Iyer, R. Suryanarayanan, Lam, Andrew M, Maeda, Yuji, Mele, Thomas, Smith, Jacob W, Seutter, Sean M, Tandon, Sanjeev, Singh Thakur, Randhir P, Thirupapuliyur, Sunderraj

Volltext bestellen

Silicon nitride film with stress control von SINGH THAKUR RANDHIR P, SMITH JACOB W, SEUTTER SEAN M, MAEDA YUJI, IYER R. SURYANARAYANAN, LAM ANDREW M, MELE THOMAS, THIRUPAPULIYUR SUNDERRAJ, TANDON SANJEEV

Volltext bestellen

AN ASSEMBLY, A SEMICONDUCTOR DEVICE AND A METHOD OF MAKING A SEMICONDUCTOR DEVICE von SMITH JACOB W, SEUTTER SEAN M, MAEDA YUJI, IYER R. SURYANARAYANAN, THAKUR RANDHIR P. SINGH, LAM ANDREW M, MELE THOMAS, THIRUPAPULIYUR SUNDERRAJ, TANDON SANJEEV

Volltext bestellen