Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions von Kounis-Melas, Andreas, Vella, Joseph R., Panagiotopoulos, Athanassios Z., Graves, David B.

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SupplementaryMaterial von Kounis-Melas, Andreas, Vella, Joseph, Panagiotopoulos, Athanassios, Graves, David B.

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Nitrogen doping of ZnSe by OMVPE using a novel organometallic precursor von Akram, Salman, Bhat, Ishwara B., Melas, Andreas A.

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Sims and photoluminescence evaluation of high purity InP grown by organometallic vapor phase epitaxy von Aina, O., Mattingly, M., Steinhauser, S., Mariella, R., Melas, Andreas

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Compound semiconductor modified surface by use of pulsed electron beam and ion implantation through a deposited metal layer von MELAS ANDREAS A

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Method to reduce crystal defects particularly in group III-nitride layers and substrates von Melas, Andreas A

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Method to reduce crystal defects particularly in group III-nitride layers and substrates von MELAS ANDREAS A

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Method to reduce crystal defects particularly in group III-nitride layers and substrates von MELAS ANDREAS A

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Vacuum chemical epitaxial growth of GaAs films using dimethylamine gallane von Malocsay, E., Sundaram, V., Fraas, L., Melas, Andreas

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MOCVD of indium oxide and indium/tin oxide films on substrates von MELAS, ANDREAS A

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METHOD OF PRODUCING HALIDE-FREE METAL OXIDES von MELAS, ANDREAS A

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PROCESS FOR TRANSITION METAL NITRIDES THIN FILM DEPOSITION von MELAS, ANDREAS A

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Method of producing halide-free metal and hydroxides von MELAS, ANDREAS A

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Gallium hydride/trialkylamine adducts, and their use in deposition of III-V compound films von MELAS, ANDREAS A

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Method of producing halide-free metal oxides von MELAS, ANDREAS A

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Process for transition metal nitrides thin film deposition von MELAS, ANDREAS A

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GALLIUM HYDRIDE/TRIALKYLAMINE ADDUCTS, AND THEIR USE IN DEPOSITION OF III-V COMPOUND FILMS von BRAUNAGEL, NORBERT, MELAS, ANDREAS A

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New Sales Manager for AIXTRON North America von Melas, Andreas A.

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Method for vapor phase deposition of gallium nitride film von MELAS, ANDREAS A, BRAUNAGEL, NORBERT

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Gallium Hydride/trialkylamine adducts, and their use in deposition of III-V compound films von BRAUNAGEL, NORBERT, MELAS, ANDREAS A

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