Prospects for charged particle lithography as a manufacturing technology von Fabian Pease, R., Han, Liqun, Winograd, Gil I., Meisburger, W.D., Pickard, Dan, McCord, M.A.

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Application of the SEMSpec electron-beam inspection system to in-process defect detection on semiconductor wafers von Cass, T.R., Hendricks, D., Jau, J., Dohse, H.J., Brodie, A.D., Meisburger, W.D.

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Conceptual models for understanding and minimizing Coulomb interactions von Brodie, A.D., Meisburger, W.D.

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