Digital FIR filters for high speed PRML disk read channels von Pearson, D.J., Reynolds, S.K., Megdanis, A.C., Gowda, S., Wrenner, K.R., Immediato, M., Galbraith, R.L., Shin, H.J.

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A scaled 0.25- mu m bipolar technology using full e-beam lithography von Cressler, J.D., Warnock, J., Coane, P.J., Chiong, K.N., Rothwell, M.E., Jenkins, K.A., Burghartz, J.N., Petrillo, E.J., Mazzeo, N.J., Megdanis, A.C., Hohn, F.J., Thomson, M.G., Sun, J.Y.-C., Tang, D.D.

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In situ arsenic-doped polysilicon for VLSI applications von Arienzo, M., Megdanis, A.C., Sackles, P.E., Michel, A.E.

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