Intercalated Organic−Inorganic Perovskites Stabilized by Fluoroaryl−Aryl Interactions von Mitzi, David B, Medeiros, David R, Malenfant, Patrick R. L

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[(CH3)3NCH2CH2NH3]SnI4:  A Layered Perovskite with Quaternary/Primary Ammonium Dications and Short Interlayer Iodine−Iodine Contacts von Xu, Zhengtao, Mitzi, David B, Medeiros, David R

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Recent Advances in the Development of Chemically Amplified Resists for Applications in Electron Beam Lithography von Medeiros, David R.

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Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography von Goldfarb, Dario L., Vyklicky, Libor, Burns, Sean D., Petrillo, Karen, Arnold, John, Lisi, Anthony, Pfeiffer, Dirk, Sanders, Daniel D., Allen, Robert D., Medeiros, David R., Owe-Yang, Dah Chung, Noda, Kazumi, Tachiban, Seiichiro, Shirai, Shozo

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A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist von Lin, Qinghuang, Steinhäusler, Thomas, Simpson, Logan, Wilder, Michelle, Medeiros, David R, Willson, C. Grant, Havard, Jennifer, Fréchet, Jean M. J

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Low-Temperature Melt Processing of Organic−Inorganic Hybrid Films von Mitzi, David B., Medeiros, David R., DeHaven, Patrick W.

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Bilayer Resists for 193 nm Lithography: SSQ and POSS von Ito, Hiroshi, Truong, Hoa D., Burns, Sean D., Pfeiffer, Dirk, Medeiros, David R.

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Design of Photoresists with Reduced Environmental Impact. 1. Water-Soluble Resists Based on Photo-Cross-Linking of Poly(vinyl alcohol) von Havard, Jennifer M, Shim, Sang-Yeon, Fréchet, Jean M. J, Lin, Qinghuang, Medeiros, David R, Willson, C. Grant, Byers, Jeffrey D

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The Photopolymer Science and Technology Award von Goldfarb, Dario L., Vylicky, Libor, Burns, Sean D., Petrillo, Karen, Arnold, John, Lisi, Anthony, Pfeiffer, Dirk, Sanders, Daniel P., Allen, Robert D., Medeiros, David R., Owe-Yang, Dah chung, Noda, Kazumi, Tachibana, Seiichiro, Shirai, Shozo

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Laterally Linked Liquid Crystal Dimers with Electrooptic Properties von Medeiros, David R, Hale, Michael A, Leitko, Jeffrey K, Willson, C. Grant

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X-ray Diffraction and Torsional Viscosity Investigations of Laterally Linked SC Liquid Crystal Dimers von Hale, Michael A, Medeiros, David R, Dombrowski, Katherine D, Willson, C. Grant

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Measurements of acid generation by extreme ultraviolet irradiation in lithographic films von Glodde, Martin, Goldfarb, Dario L., Medeiros, David R., Wallraff, Gregory M., Denbeaux, Gregory P.

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[(CH 3 ) 3 NCH 2 CH 2 NH 3 ]SnI 4 :  A Layered Perovskite with Quaternary/Primary Ammonium Dications and Short Interlayer Iodine−Iodine Contacts von Xu, Zhengtao, Mitzi, David B., Medeiros, David R.

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Bilayer Resists for 193 nm Lithography von Ito, Hiroshi, D. Truong, Hoa, D. Burns, Sean, Pfeiffer, Dirk, R. Medeiros, David

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Study of resolution limits due to intrinsic bias in chemically amplified photoresists von Postnikov, Sergei V., Stewart, Michael D., Tran, Hoang Vi, Nierode, Mark A., Medeiros, David R., Cao, T., Byers, Jeffrey, Webber, Stephen E., Wilson, C. Grant

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X-ray Diffraction and Torsional Viscosity Investigations of Laterally Linked S C Liquid Crystal Dimers von Hale, Michael A., Medeiros, David R., Dombrowski, Katherine D., Willson, C. Grant

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Reflexionsmindernde Hartmaskenzusammensetzung und Verfahren zur Herstellung eines strukturierten Materials damit von Medeiros, David R, Pfeiffer, Dirk, Burns, Sean D

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Ferroelectric cyclic oligosiloxane liquid crystals von MEDEIROS, D. R, HALE, M. A, HUNG, R. J. P, LEITKO, J. K, WILLSON, C. G

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Antireflective hardmask composition and a method of preparing a patterned material using same von BURNS SEAN D, MEDEIROS DAVID R, PFEIFFER DIRK

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Low temperature melt-processing of organic-inorganic hybrid von MITZI DAVID B, MEDEIROS DAVID R, DEHAVEN PATRICK W

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