Material properties and characteristics of polysilicon transistors for large area electronics von Migliorato, P., Meakin, D.B.

Volltext

Low defect-density polycrystalline silicon for high performance thin film transistors von Meakin, D.B., Economou, N.A., Coxon, P.A., Stoemenos, J., Lowe, A., Migliorato, P.

Volltext

Uniform deposition of in situ doped polysilicon films by ultralow pressure chemical vapour deposition von Ahmed, W., Pilkington, R.D., Meakin, D.B.

Volltext

Phosphorus-doped silicon films prepared by low pressure chemical vapour deposition of disilane and phosphine von Ahmed, W., Meakin, D.B.

Volltext