Novel Organic Resists for Nanoscale Imaging: From Chemically Amplified Cycloaliphatic Resists to Dendrimer Monolayers von Pasini, D., Niu, Q.J., Meagley, R.P., Tully, D.C., Trimble, A.R., Fréchet, J.M.J.

Volltext

Novel Organic Resists for Nanoscale Imaging. From Chemically Amplified Cycloaliphatic Resists to Dendrimer Monolayer von Pasini, D., Niu, Q.J., Meagley, R.P., Tully, D.C., Trimble, A.R., Fréchet, J.M.J.

Volltext

Novel Organic Resists for Nanoscale Imaging von Pasini, D, Niu, Q.J, Meagley, R.P, Tully, D.C, Trimble, A.R, Fréchet, J.M.J

Volltext