Novel Organic Resists for Nanoscale Imaging: From Chemically Amplified Cycloaliphatic Resists to Dendrimer Monolayers von Pasini, D., Niu, Q.J., Meagley, R.P., Tully, D.C., Trimble, A.R., Fréchet, J.M.J.

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Novel Organic Resists for Nanoscale Imaging. From Chemically Amplified Cycloaliphatic Resists to Dendrimer Monolayer von Pasini, D., Niu, Q.J., Meagley, R.P., Tully, D.C., Trimble, A.R., Fréchet, J.M.J.

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Novel Organic Resists for Nanoscale Imaging von Pasini, D, Niu, Q.J, Meagley, R.P, Tully, D.C, Trimble, A.R, Fréchet, J.M.J

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Pixelated photoresists von Meagley, Robert P, Goodner, Michael D, Leet, Bob E, McSwiney, Michael L

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Inhibitors of HIV-1 Reverse Transcriptase-Associated Ribonuclease H Activity von Ilina, Tatiana, Labarge, Krystal, Sarafianos, Stefan G, Ishima, Rieko, Parniak, Michael A

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Fluorine-free Photoacid Generators for 193 nm Lithography Based on Non-Sulfonate Organic Superacids von Glodde, Martin, Liu, Sen, Varanasi, Pushkara Raoi

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β-内酯类蛋白酶体抑制剂乳胞素及其衍生物的合成研究进展（英文） von 王玉平 朱晓伟 辛健 郭妍妍 徐向楠 马宇衡

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Chemical Failure Mode Addition to the Failure Mode Taxonomy von WASHBURN, Carlton, GRANTHAM, Katie

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Directory of Cases & Legislation

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Photoimageable, thermosettable fluorinated resists von Kim, Young H

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