Core-Shell Germanium/Germanium–Tin Nanowires Exhibiting Room-Temperature Direct- and Indirect-Gap Photoluminescence von Meng, Andrew C, Fenrich, Colleen S, Braun, Michael R, McVittie, James P, Marshall, Ann F, Harris, James S, McIntyre, Paul C

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Ultra-High-Yield Growth of Vertical Single-Walled Carbon Nanotubes: Hidden Roles of Hydrogen and Oxygen von Zhang, Guangyu, Mann, David, Zhang, Li, Javey, Ali, Li, Yiming, Yenilmez, Erhan, Wang, Qian, James P. Mc Vittie, Yoshio Nishi, Gibbons, James, Dai, Hongjie

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Ge-Interface Engineering With Ozone Oxidation for Low Interface-State Density von Kuzum, D., Krishnamohan, T., Pethe, A.J., Okyay, A.K., Oshima, Y., Yun Sun, McVittie, J.P., Pianetta, P.A., McIntyre, P.C., Saraswat, K.C.

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Technology and reliability constrained future copper interconnects - Part I: Resistance modeling von Kapur, Pawan, McVittie, James P, Saraswat, Krishna C

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Technology and reliability constrained future copper interconnects - Part II: Performance implications von Kapur, Pawan, Chandra, Gaurav, McVittie, James P, Saraswat, Krishna C

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Integrating Phase-Change Memory Cell With Ge Nanowire Diode for Crosspoint Memory-Experimental Demonstration and Analysis von SangBum Kim, Yuan Zhang, McVittie, J.P., Jagannathan, H., Nishi, Y., Wong, H.-S.P.

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Mechanism of Surface Charging Effects on Etching Profile Defects von Shigemi Murakawa, Shigemi Murakawa, James P. McVittie, James P. McVittie

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Direct measurement of surface charging during plasma etching von MURAKAWA, S, MCVITTIE, J. P

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Analytical modeling of silicon etch process in high density plasma von Abdollahi-Alibeik, Shahram, McVittie, James P., Saraswat, Krishna C., Sukharev, Valeriy, Schoenborn, Philippe

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A tuned langmuir probe for measurements in rf glow discharges von PARANJPE, A. P, MCVITTIE, J. P, SELF, S. A

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Charging damage to gate oxides in an O2 magnetron plasma von SYCHYI FANG, MCVITTIE, J. P

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A two-dimensional computer simulation for dry etching using Monte Carlo techniques von IGNACIO ULACIA F, J, MCVITTIE, J. P

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Ion trajectory distortion and profile tilt by surface charging in plasma etching von Murakawa, Shigemi, Fang, Sychyi, McVittie, James P.

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New test structure to identify step coverage mechanisms in chemical vapor deposition of silicon dioxide von LIE-YEA CHENG, MCVITTIE, J. P, SARASWAT, K. C

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Model for oxide damage from gate charging during magnetron etching von SYCHYI FANG, MCVITTIE, J. P

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Effects of wafer temperature on plasma charging induced damage to MOS gate oxide von Shawming Ma, McVittie, J.P., Saraswat, K.C.

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Templated Electrochemical Synthesis of Titania Nanopillars on Conductive Substrates von Chen, Ying, Park, Sang-Min, Kim, Ho-Cheol, McVittie, James P., Ting, Chiu, Nish, Yoshio

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Sensitivity and limitations of plasma charging damage measurements using MOS capacitors structures von Shawming Ma, Abdel-Ati, W.L.N., McVittie, P.

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Analysis of injection current through thin gate oxide during metal etch von Kinoshita, Takashi, Krishnan, Srikanth, Dostalik, Willam W., McVittie, James. P.

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Electrical properties of heavily doped polycrystalline silicon-germanium films von King, T.-J., McVittie, J.P., Saraswat, K.C., Pfiester, J.R.

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