Constraint Effects on Thin Film Channel Cracking Behavior von Tsui, Ting Y., McKerrow, Andrew J., Vlassak, Joost J.

Volltext

The effect of water diffusion on the adhesion of organosilicate glass film stacks von Tsui, Ting Y., McKerrow, Andrew J., Vlassak, Joost J.

Volltext

Fluorescence and Redox Activity of Probes Anchored through an Aminotrithiol to Polycrystalline Gold von Fox, Marye Anne, Whitesell, James K, McKerrow, Andrew J

Volltext

Review on recent progress in patterning phase change materials von Shen, Meihua, Lill, Thorsten, Altieri, Nick, Hoang, John, Chiou, Steven, Sims, Jim, McKerrow, Andrew, Dylewicz, Rafal, Chen, Ernest, Razavi, Hamid, Chang, Jane P.

Volltext

The effect of elastic modulus on channel crack propagation in organosilicate glass films von Tsui, Ting Y., Griffin, A.J., Fields, Russell, Jacques, Jeannette M., McKerrow, Andrew J., Vlassak, Joost J.

Volltext

Measurement of elastic modulus, Poisson ratio, and coefficient of thermal expansion of on-wafer submicron films von Zhao, Jie-Hua, Ryan, Todd, Ho, Paul S., McKerrow, Andrew J., Shih, Wei-Yan

Volltext

Materials Issues and Characterization of Low-k Dielectric Materials von Ryan, E. Todd, McKerrow, Andrew J., Leu, Jihperng, Ho, Paul S.

Volltext

Aggregation of squaraine dyes: Structure-property relationships and solvent effects von McKerrow, Andrew J, Buncel, Erwin, Kazmaier, Peter M

Volltext

On-wafer characterization of thermomechanical properties of dielectric thin films by a bending beam technique von Zhao, Jie-Hua, Ryan, Todd, Ho, Paul S., McKerrow, Andrew J., Shih, Wei-Yan

Volltext

Thermomechanical properties and moisture uptake characteristics of hydrogen silsesquioxane submicron films von Zhao, Jie-Hua, Malik, Irfan, Ryan, Todd, Ogawa, Ennis T., Ho, Paul S., Shih, Wei-Yan, McKerrow, Andrew J., Taylor, Kelly J.

Volltext

Thin film interaction between low- k dielectric hydrogen silsesquioxane (HSQ) and Ti barrier layer von Zeng, Yuxiao, Russell, Stephen W., McKerrow, Andrew J., Chen, Peijun, Alford, T.L.

Volltext

CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE USING A REMOTE PLASMA von MCKERROW, Andrew J, TANG, Shane, BHIMARASETTI, Gopinath

Volltext bestellen

DOPED SILICON OR BORON LAYER FORMATION von MCKERROW, Andrew John, WANG, Yuxi, GONG, Bo, YANG, Nuoya

Volltext bestellen

Molecular modelling of photoactive pigments in the solid state: Investigations of polymorphism von McKerrow, Andrew J, Buncel, Erwin, Kazmaier, Peter M

Volltext

Advanced Metallization Conference 2001 Held in October von Mckerrow, Andrew J., Shacham-Diamand, Yosi

Volltext

DEPOSITION AND ETCH OF SILICON-CONTAINING LAYER von MCKERROW, Andrew John, CHANG, Ching-Yun, WANG, Yuxi, GONG, Bo, YANG, Nuoya

Volltext bestellen

Quantitative investigations of the aggregation behaviour of hydrophobic anilino squaraine dyes through UV/vis spectroscopy and dynamic light scattering von Wojtyk, James, McKerrow, Andrew, Kazmaier, Peter, Buncel, Erwin

Volltext

LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NITRIDE von MCKERROW, Andrew John, BHIMARASETTI, Gopinath, GONG, Bo, GUPTA, Awnish, PETRAGLIA, Jennifer Leigh, AUSTIN, Dustin Zachary

Volltext bestellen

Holistic Integrated Process Solutions for Patterning Phase Change Memory Devices von Hoang, John, Shen, Meihua, Lill, Thorsten, Qian, Danna, Routzahn, Aaron, Chen, Jack, Altieri, Nick, Yu, Anthony, Dulkin, Alexander, Sims, Jim, McKerrow, Andrew, Dylewicz, Rafal

Volltext

SIXNY AS A NUCLEATION LAYER FOR SICXOY von LAI, Fengyuan, MCKERROW, Andrew, NARKEVICIUTE, Ieva, YUAN, Guangbi, VARADARAJAN, Bhadri, GONG, Bo

Volltext bestellen