Graphitization of Glassy Carbon after Compression at Room Temperature von Shiell, T B, McCulloch, D G, McKenzie, D R, Field, M R, Haberl, B, Boehler, R, Cook, B A, de Tomas, C, Suarez-Martinez, I, Marks, N A, Bradby, J E

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The microstructure and mechanical properties of TiN-Ni nanocomposite thin films von PAGON, A. M, DOYLE, E. D, MCCULLOCH, D. G

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The role of pulse length in target poisoning during reactive HiPIMS: application to amorphous HfO2 von Ganesan, R, Murdoch, B J, Treverrow, B, Ross, A E, Falconer, I S, Kondyurin, A, McCulloch, D G, Partridge, J G, McKenzie, D R, Bilek, M M M

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The structural phases of non-crystalline carbon prepared by physical vapour deposition von Lau, D.W.M., Moafi, A., Taylor, M.B., Partridge, J.G., McCulloch, D.G., Powles, R.C., McKenzie, D.R.

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A combinatorial comparison of DC and high power impulse magnetron sputtered Cr2AlC von Field, M.R., Carlsson, P., Eklund, P., Partridge, J.G., McCulloch, D.G., McKenzie, D.R., Bilek, M.M.M.

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Structural and dielectric properties of energetically deposited hafnium oxide films von Murdoch, B J, McCulloch, D G, Partridge, J G

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Controlled glow to arc transition in sputtering for high rate deposition of carbon films von Lattemann, M., Abendroth, B., Moafi, A., McCulloch, D.G., McKenzie, D.R.

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An energy landscape for carbon network solids von Powles, R.C., Marks, N.A., Lau, D.W.M., McCulloch, D.G., McKenzie, D.R.

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Stable n -channel metal-semiconductor field effect transistors on ZnO films deposited using a filtered cathodic vacuum arc von Elzwawi, S, Kim, H-S, Lynam, M, Mayes, ELH, McCulloch, D G, Allen, M W, Partridge, J G

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Ultraviolet detection from energetically deposited titania films von Field, M. R., Murdoch, B. J., McCulloch, D. G., Partridge, J. G.

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Energetically deposited nano-composite films of high speed steel and titanium nitride von Pagon, A.M., McCulloch, D.G., Doyle, E.D., Partridge, J.G.

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Effect of Schottky gate type and channel defects on the stability of transparent ZnO MESFETs von Elzwawi, S, Hyland, A, Lynam, M, Partridge, J G, McCulloch, D G, Allen, M W

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Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS) von Partridge, J G, Mayes, E L H, McDougall, N L, Bilek, M M M, McCulloch, D G

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The microstructure and properties of energetically deposited carbon nitride films von Sadek, A.Z., Kracica, M., Moafi, A., Lau, D.W.M., Partridge, J.G., McCulloch, D.G.

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Titanium nitride/vanadium nitride alloy coatings: mechanical properties and adhesion characteristics von Latella, B.A., Gan, B.K., Davies, K.E., McKenzie, D.R., McCulloch, D.G.

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Memristor and selector devices fabricated from HfO2−xNx von Murdoch, B. J., McCulloch, D. G., Ganesan, R., McKenzie, D. R., Bilek, M. M. M., Partridge, J. G.

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Plasma-based ion implantation utilising a cathodic arc plasma von Bilek, M.M.M, McKenzie, D.R, Tarrant, R.N, Lim, S.H.M, McCulloch, D.G

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Energetic deposition of carbon clusters with preferred orientation using a new mixed mode cathodic arc – Sputtering process von Lattemann, M., Moafi, A., Bilek, M.M.M., McCulloch, D.G., McKenzie, D.R.

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Microstructural and tribological characterisation of a nitriding/TiAlN PVD coating duplex treatment applied to M2 High Speed Steel tools von Rousseau, A.F., Partridge, J.G., Mayes, E.L.H., Toton, J.T., Kracica, M., McCulloch, D.G., Doyle, E.D.

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The influence of deposition rate on the stress and microstructure of AlN films deposited from a filtered cathodic vacuum arc von Taylor, M.B., Partridge, J.G., McCulloch, D.G., Bilek, M.M.M., McKenzie, D.R.

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