Simulation Technology for Health Care Professional Skills Training and Assessment von Issenberg, S. Barry, McGaghie, William C, Hart, Ian R, Mayer, Joan W, Felner, Joel M, Petrusa, Emil R, Waugh, Robert A, Brown, Donald D, Safford, Robert R, Gessner, Ira H, Gordon, David Lee, Ewy, Gordon A

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Characterization of the physical and electrical properties of Indium tin oxide on polyethylene napthalate von Han, H., Adams, Daniel, Mayer, J. W., Alford, T. L.

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Physical mechanisms behind the ion-cut in hydrogen implanted silicon von Höchbauer, T., Misra, A., Nastasi, M., Mayer, J. W.

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Ion beams in silicon processing and characterization von Chason, E., Picraux, S. T., Poate, J. M., Borland, J. O., Current, M. I., Diaz de la Rubia, T., Eaglesham, D. J., Holland, O. W., Law, M. E., Magee, C. W., Mayer, J. W., Melngailis, J., Tasch, A. F.

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Ion beam mixing in metallic and semiconductor materials von Nastasi, M., Mayer, J.W.

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Investigation of the cut location in hydrogen implantation induced silicon surface layer exfoliation von Höchbauer, T., Misra, A., Nastasi, M., Mayer, J. W.

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Plasma hydrogenation of strained Si ∕ SiGe ∕ Si heterostructure for layer transfer without ion implantation von Shao, Lin, Lin, Yuan, Lee, J. K., Jia, Q. X., Wang, Yongqiang, Nastasi, M., Thompson, Phillip E., Theodore, N. David, Chu, Paul K., Alford, T. L., Mayer, J. W., Chen, Peng, Lau, S. S.

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Effects of hydrogen implantation temperature on ion-cut of silicon von Lee, J. K., Nastasi, M., Theodore, N. David, Smalley, A., Alford, T. L., Mayer, J. W., Cai, M., Lau, S. S.

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Orientation dependence of blistering in H-implanted Si von Zheng, Y., Lau, S. S., Höchbauer, T., Misra, A., Verda, R., He, X.-M., Nastasi, M., Mayer, J. W.

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Oxidation and protection in copper and copper alloy thin films von LI, J, MAYER, J. W, COLGAN, E. G

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Investigation of thermal stability, phase formation, electrical, and microstructural properties of sputter-deposited titanium aluminide thin films von Kim, H.C., Theodore, N.D., Gadre, K.S., Mayer, J.W., Alford, T.L.

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Investigation of plasma hydrogenation and trapping mechanism for layer transfer von Chen, Peng, Chu, Paul K., Höchbauer, T., Lee, J.-K., Nastasi, M., Buca, D., Mantl, S., Loo, R., Caymax, M., Alford, T., Mayer, J. W., Theodore, N. David, Cai, M., Schmidt, B., Lau, S. S.

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The effect of Au thickness and annealing conditions on SiO2 formation in the Au/Si system von Julies, B.A., Adams, Daniel, Mayer, J.W.

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Formation of silicides in a cavity applicator microwave system von Thompson, D. C., Kim, H. C., Alford, T. L., Mayer, J. W.

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Fabrication of silicon-on-SiO2/diamondlike-carbon dual insulator using ion cutting and mitigation of self-heating effects von Di, Zengfeng, Chu, Paul K., Zhu, Ming, Fu, Ricky K. Y., Luo, Suhua, Shao, Lin, Nastasi, M., Chen, Peng, Alford, T. L., Mayer, J. W., Zhang, Miao, Liu, Weili, Song, Zhitang, Lin, Chenglu

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Towards a new archaeometry von Mayer, J W, Menu, M

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H-induced platelet and crack formation in hydrogenated epitaxial Si∕Si0.98B0.02∕Si structures von Shao, Lin, Lin, Yuan, Swadener, J. G., Lee, J. K., Jia, Q. X., Wang, Y. Q., Nastasi, M., Thompson, Phillip E., Theodore, N. David, Alford, T. L., Mayer, J. W., Chen, Peng, Lau, S. S.

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Formation of hydrogen complexes in proton implanted silicon and their influence on the crystal damage von Höchbauer, T., Misra, A., Nastasi, M., Mayer, J.W., Ensinger, W.

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Silver Metallization: Stability and Reliability von Adams, Daniel, Alford, Terry L, Mayer, James W

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Compound Phase Formation in Thin Film Structures von Pretorius, René, Theron, Christiaan C., Vantomme, André, Mayer, James W.

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