Nickel-assisted metal-induced crystallization of silicon: Effect of native silicon oxide layer von Pereira, L., Martins, R.M.S., Schell, N., Fortunato, E., Martins, R.

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Polycrystalline silicon obtained by metal induced crystallization using different metals von Pereira, L., Águas, H., Martins, R.M.S., Vilarinho, P., Fortunato, E., Martins, R.

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Study of the textural evolution in Ti-rich NiTi using synchrotron radiation von Paula, A.S., Canejo, J.H.P.G., Mahesh, K.K., Silva, R.J.C., Fernandes, F.M. Braz, Martins, R.M.S., Cardoso, A.M.A., Schell, N.

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Effect of thermal cycling on the transformation temperature ranges of a Ni–Ti shape memory alloy von Paula, A.S., Canejo, J.P.H.G., Martins, R.M.S., Braz Fernandes, F.M.

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New WC-Cu composites for the divertor in fusion reactors von Dias, M., Pinhão, N., Faustino, R., Martins, R.M.S., Ramos, A.S., Vieira, M.T., Correia, J.B., Camacho, E., Braz Fernandes, F.M., Nunes, B., Almeida, A., Mardolcar, U.V., Alves, E.

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Phase transformations in Ni/Ti multilayers investigated by synchrotron radiation-based x-ray diffraction von Cavaleiro, A.J., Ramos, A.S., Martins, R.M.S., Fernandes, F.M. Braz, Morgiel, J., Baehtz, C., Vieira, M.T.

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The effect of heating rate on the phase transformation of Ni/Ti multilayer thin films von Cavaleiro, A.J., Ramos, A.S., Martins, R.M.S., Braz Fernandes, F.M., Vieira, M.T.

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Characterization of mesoporous ZnO:SiO 2 films obtained by the sol–gel method von Martins, R.M.S., Musat, V., Mücklich, A., Franco, N., Fortunato, E.

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Texture development, microstructure and phase transformation characteristics of sputtered Ni–Ti Shape Memory Alloy films grown on TiN von Martins, R.M.S., Schell, N., Reuther, H., Pereira, L., Mahesh, K.K., Silva, R.J.C., Fernandes, F.M. Braz

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Characterization of mesoporous ZnO:SiO2 films obtained by the sol-gel method von MARTINS, RM. S, MUSAT, V, MÜCKLICH, A, FRANCO, N, FORTUNATO, E

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Microstructure and nonbasal-plane growth of epitaxial Ti2AlN thin films von Beckers, M., Schell, N., Martins, R. M. S., Mücklich, A., Möller, W., Hultman, L.

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The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films von Beckers, M., Höglund, C., Baehtz, C., Martins, R. M. S., Persson, P. O. Å., Hultman, L., Möller, W.

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Corrigendum to “Nickel assisted metal induced crystallization of silicon: Effect of native silicon oxide layer” [Thin Solid Films 511–512 (2006) 275–279] von Pereira, L., Martins, R.M.S., Schell, N., Fortunato, E., Martins, R.

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Study of graded Ni-Ti shape memory alloy film growth on Si(100) substrate von Martins, R.M.S., Schell, N., Mücklich, A., Reuther, H., Beckers, M., Silva, R.J.C., Pereira, L., Braz Fernandes, F.M.

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Simultaneous probing of phase transformations in Ni-Ti thin film shape memory alloy by synchrotron radiation-based X-ray diffraction and electrical resistivity von Braz Fernandes, F.M., Mahesh, K.K., Martins, R.M.S., Silva, R.J.C., Baehtz, C., von Borany, J.

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Role of the substrate on the growth of Ni–Ti sputtered thin films von Martins, R.M.S., Schell, N., Beckers, M., Silva, R.J.C., Mahesh, K.K., Fernandes, F.M. Braz

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The dependence of the nanostructure of magnetron sputtered Cu–Ag alloy films on composition and temperature von Almtoft, K. Pagh, Ejsing, A.M., Bøttiger, J., Chevallier, J., Schell, N., Martins, R.M.S.

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The influence of the growth rate on the preferred orientation of magnetron-sputtered Ti-Al-N thin films studied by in situ x-ray diffraction von Beckers, M., Schell, N., Martins, R. M. S., Mücklich, A., Möller, W.

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Structural evolution of magnetron sputtered shape memory alloy Ni–Ti films von Martins, R.M.S., Schell, N., von Borany, J., Mahesh, K.K., Silva, R.J.C., Braz Fernandes, F.M.

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In- situ study of Ni–Ti thin film growth on a TiN intermediate layer by X-ray diffraction von Martins, R.M.S., Schell, N., Silva, R.J.C., Pereira, L., Mahesh, K.K., Fernandes, F.M. Braz

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